• Title/Summary/Keyword: $H_2SiF_6$

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Luminescence characterization of $EU^{3+}$ and $Bi^{3+}$ co-doped in ${Y_2}{SiO_5}$ red emitting phosphor by solid state reaction method (고상 반응법으로 합성한 ${Y_2}{SiO_5}:\;EU^{3+}$, $Bi^{3+}$ 적색 형광체의 발광 특성)

  • Moon, J.W.;Song, Y.H.;Park, W.J.;Yoon, D.H.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.19 no.1
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    • pp.15-18
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    • 2009
  • To enhance near UV-visible absorption region and to applied phosphor convert-white LEOs (PC-WLEDs), a red phosphor composed of ${Y_2}{SiO_5}:\;EU^{3+}$, $Bi^{3+}$ compounds was prepared by the conventional solid-state reaction. The photoluminescence (PL) shown that samples were excited by near UV light 395 nm for measurement of PL spectra. Emission spectra of samples have shown red emissions at 612 nm ($^5D_0{\to}^7F_2$). The enhanced near $UV{\sim}$ visible excitation spectrum with a broad band centered at 258 nm and 282 nm originated in the transitions toward the charge transfer state (CTS) due to the $Eu^{3+}-Bi^{3+}-O^{2-}$ interaction. The other excitation band at $350\;nm{\sim}480\;nm$, corresponding to the transitions $^7F_0{\to}^5L_9$ (364 nm), $^7F_0{\to}^5G_3$ (381 nm), $^7F_0{\to}^5L_6$ (395 nm), $^7F_0{\to}^5D_3$, (415 nm) and $^7F_0{\to}^5D_2$ (466 nm), occurred due to enhanced the f-f transition increasing $Bi^{3+}$ and $Eu^{3+}$ ions. The PL intensity increased with increased as concentration of $Bi^{3+}$ and the emission intensity becomes with a maximum at 0.125 mol.

A study on the characteristics of planar type inductively coupled plasma and its applications on the selective oxide etching (평면형 유도결합 플라즈마의 특성 및 선택적 산화막 식각 응용에 관한 연구)

  • 양일동;이호준;황기웅
    • Journal of the Korean Vacuum Society
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    • v.6 no.1
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    • pp.91-96
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    • 1997
  • The electrical characteristics and the plasma parameters of planar inductively coupled plasmas (ICP) have been measured. The resistance of the total load including the coil and the plasma varied from 1 to 4 W and the inductance from 1.5 m to 2 mH when the power was changed from 100 to 1000 W and the pressure from 1 to 10 mTorr. The density of electron measured by Langmuir probe was over $10^{11}/\textrm{cm}^3$ and the temperature varied between 3 and 5 eV as the process conditions were changed. Bias modulation was adopted as a new method to improve the selectivity of $SiO_2$on Si in $C_4F_8$ (octafluorocyclobutane) plasma. The selectivity was improved as the duty ratio decreased, but the etch rate of $SiO_2$decreased below 400$\AA$/min. $H_2$addition to $C_4F_8$ plasma showed that the etch selectivity could be higher than 50 and the etch rate of $SiO_2$over 2000$\AA$/min when 60% $H_2$was added.

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Spectroscopic Studies on Electroless Deposition of Copper on Hydrogen-Terminated Si(111) Surface in NH4F Solution Containing Cu(II) Ions

  • Lee, In-Churl;Bae, Sang-Eun;Song, Moon-Bong;Lee, Jong-Soon;Paek, Se-Hwan;J.Lee, Chi-Woo
    • Bulletin of the Korean Chemical Society
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    • v.25 no.2
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    • pp.167-171
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    • 2004
  • The electroless deposition of copper on the hydrogen-terminated Si(111) surface was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning tunneling microscopy (STM), and energy-dispersive spectroscopy (EDS). The hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. It was found from ATR-FTIR that two bands centered at 2000 and 2260 $cm^{-1}$ appeared after the H-Si(111) surface was immersed in 40% $NH_4F$ solution containing 10 mM $Cu^{2+}$. On the other hand, STM image included the copper islands with a height of 5 nm and a diameter of 10-20 nm. The EDS data displayed the presence of copper, silicon and oxygen species. The results were rationalized in terms of the redox reaction of surface Si atoms and $Cu^{2+}$ ions in solutions, which are changed into $Si(OH)_x(F)_y$ containing $SiF_6^{2-}$ ions and neutral copper islands.

Deposition and Analysis of Fluorinated Amorphous Carbon Thin Films by PECVD (PECVD에 의한 비정질 불화탄소막의 증착 및 특성분석)

  • Kim, Ho-Woon;Shin, Jang-Kyoo;Kwon, Dae-Hyuk;Seo, Hwa-Il
    • Journal of Sensor Science and Technology
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    • v.13 no.3
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    • pp.182-187
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    • 2004
  • The fluorinated amorphous carbon thin films (a-C:F) were deposited by PECVD(plasma enhanced chemical vapor deposition). The precursors were $C_{4}F_{8}$ which had a similar ratio of target film's carbon to fluorine ratio, and $Si_{2}H_{6}$/He for capturing excessive fluorine ion. We varied deposition condition of temperature and working pressure to survey the effect of each changes. We measured dielectric constant, composition, and etc. At low temperature the film adhesion to substrate was very poor although the growth rate was very high, the growth rate was very low at high temperature. The EDS(energy dispersive spectroscopy) result showed carbon and fluorine peak for films and Si peak for substrate. There was no oxygen peak.

Effects of Al2O3-RE2O3 Additive for the Sintering of SiC and the Fabrication of SiCf/SiC Composites (SiC 소결에 미치는 Al2O3-RE2O3 첨가제의 영향과 SiCf/SiC 복합체의 제조)

  • Yu, Hyun-Woo;Raju, Kati;Park, Ji Yeon;Yoon, Dang-Hyok
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.364-371
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    • 2013
  • The sintering behavior of monolithic SiC is examined using the binary sintering additive of $Al_2O_3$-rare earth oxide ($RE_2O_3$, where RE = Sc, Nd, Dy, Ho, or Yb). Through hot pressing at 20 MPa and $1750^{\circ}C$ for 1 h in an Ar atmosphere for 52 nm fine ${\beta}$-SiC powder added with 5 wt% sintering additive, a SiC density of > 97% is achieved, which indicates the effectiveness of $Al_2O_3-RE_2O_3$ system as a sintering of additive for SiC. Based on this result, 7 wt% of $Al_2O_3-Sc_2O_3$ is tested as an additive system for the fabrication of a continuous SiC fiber-reinforced SiC-matrix composite ($SiC_f$/SiC). Electrophoretic deposition combined with the application of ultrasonic pulses is used to efficiently infiltrate the matrix phase into the voids of $Tyranno^{TM}$-SA3 fabric. After hot pressing, a composite density of > 97% is obtained, along with a maximum flexural strength of 443 MPa.

A Study on the mechanism of $SiO_2$ film deposition by Laser CVD (레이져 CVD에 의한 $SiO_2$막의 형성기구 모델링에 관한 연구)

  • Ryoo, Ji-Ho;So, Hwang-Young;Kim, Young-Hoon;Sung, Yung-Kwon
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1149-1151
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    • 1995
  • In order to examine the deposition mechanism for $SiO_2$ by ArF(193nm) excimer Laser using $Si_2H_6$ and $N_2O$ gas mixture, deposition rate and refractive index were measured and creative modeling on film deposition was established by suggesting now precursor and film growing mechanism.

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NaHSO4/SiO2: An Efficient Catalyst for the Synthesis of β-Enaminones and 2-Methylquinolin-4(1H)-Ones under Solvent-Free Condition (NaHSO4/SiO2: Solvent-Free 반응 조건에서 β-Enaminone들과 2-Methylquinolin-4(1H)-One들의 합성을 위한 효율적인 촉매)

  • Sapkal, Suryakant B.;Shelke, Kiran F.;Shingate, Bapurao B.;Shingare, Murlidhar S.
    • Journal of the Korean Chemical Society
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    • v.54 no.6
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    • pp.723-726
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    • 2010
  • An efficient and simplified protocol for $NaHSO_4/SiO_2$ catalyzed solvent-free synthesis of $\beta$-enaminone and 2-methylquinolin-4(1H)-one derivatives under microwave irradiation is described. A series of functionalized derivatives have been synthesized in shorter reaction times with moderate to good yields. The use of milder catalyst in non-conventional method offers significant advantages over conventional methods, such as higher selectivities, simplicity, solvent-free reaction and non-environmental polluting conditions.

Effect of Annealing Temperature on Soft Magnetic Properties of Cold Rolled 0.30 mm Thick Fe-6.5wt.%Si Foils

  • Fang, X.S.;Lin, J.P.;Liang, Y.F.;Ye, F.;Zhang, L.Q.;Chen, G.L.
    • Journal of Magnetics
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    • v.16 no.2
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    • pp.177-180
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    • 2011
  • 0.30 mm thick and 90 mm wide thin foils made of Fe-6.5wt.%Si alloy were successfully fabricated by traditional rolling. The as-rolled sheets had good shapes and shining metal luster. The effects of annealing temperature on the magnetic properties of the sheets were investigated. Excellent Dc properties ($H_c$: 11.55 A/m, ${\mu}_m$: 23710, and $B_s$: 1.439 T) were obtained at an annealing temperature of 1453 K for 1.5 h. At low frequencies ($\leq$ 1 kHz), heat treatment temperature has little effect on iron loss which remained at the level of 9.8 W/kg. Annealing at 1273 K for 1.5 h is optimum for frequencies above 5 kHz.

Reaction Properties of Dinuclear Metallocenes

  • Noh Seok-Kyun;Jeong Eung-Yeong;Qei Duang Huang Dan;Lyoo Won-Seok
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.224-225
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    • 2006
  • The Ethylene polymerization behavior of a series of polymethylene bridged dinuclear CGC $[Zr({\eta}^{5}:{\eta}^{1}-C_{9}H_{5}SiMe_{2}NCMe_{3})Me_{2}]_{2}[(CH_{2})_{n}]\;[_{n}=6(1),\;9(2),\;12(3)]$ in the cocatalytic activation with $Ph_{3}C^{+}B^{-}(C_{6}F_{5})_{4}\;(B_{1})\;or\;Ph_{3}C^{+}(C_{6}F_{5})_{3}B^{-}C_{6}F_{4}B^{-}(C_{6}F_{5})_{3}Ph_{3}C^{+}\;(B_{2})\;or\;B(C_{6}F_{5})_{3}\;(B_{3})$ were investigated to study the nuclearity effects as well as the counteranion effects. The ethylene polymerization and ethylene/1-hexene copolymerization were conducted at $30^{\circ}C$ It was found that both in ethylene polymerization and ethylene/1-hexene copolymerization, activities increased in the order of 1 < 2 < 3, which indicates the presence of longer bridge between two active sites contributes more efficiently to facilitate the polymerization activity.

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