The Etching Characteristics of Cr Films by Using $Cl_{2}O_{2}$ Gas Mixtures
($Cl_{2}O_{2}$ 가스에 의한 크롬 박막의 식각 특성 고찰)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.14 no.8
- /
- pp.634-639
- /
- 2001