• Title/Summary/Keyword: $CH_4$/Ar

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The Control of SiC/C Ratio for the Synthesis of SiC/C Functionally Gradient Materials (SiC/C 경사기능재료(FGM)의 합성을 위한 SiC/C 분율 조절)

  • 김유택;최준태;최종건;오근호
    • Journal of the Korean Ceramic Society
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    • v.32 no.6
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    • pp.685-696
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    • 1995
  • The most important techniques in the synthesis of SiC/C function gradient material (FGM) are to control the SiC/C ratio and to obtain the moderate deposition rate. For these, various gas systems and flow rates were attempted and evaluated. It turned out that the CH4+SiCl4+H2 system was suitable for the deposition of SiC-rich layers, the C3H8+SiCl4+Ar system for the deposition of carbon-rich layers, and the C3H8+SiCl4+H2+Ar system was good to deposit the layers between them.

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A Simulation of the Energy Distribution Function for Electron in Gas Mixtures (시뮬레이션을 이용한 혼합기체(混合氣體)에서 전자(電子)에너지분포함수)

  • Kim, Sang-Nam;Yu, Heoi-Young;Ha, Sung-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.194-198
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    • 2002
  • Energy Distribution Function in pure $CH_4$, $CF_4$ and mixtures of $CF_4$ and Ar, have been analyzed over a range of the reduced electric field strength between 0.1 and 350[Td] by the two-tenn approximation of the Boltzmann equation (BEq.) method and the Monte Carlo simulation (MCS). The results of the Boltzmann equation and the Monte Carlo simulation have been compared with the data presented by several workers. The deduced transport coefficients for electrons agree reasonably well with the experimental and simulation data obtained by Nakamura and Hayashi. The energy distribution function of electrons in $CF_4-Ar$ mixtures shows the Maxwellian distribution for energy. That is, f(${\varepsilon}$) has the symmetrical shape whose axis of symmetry is a most probably energy

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Deposition of $SiC_xN_y$ Thin Film as a Membrane Application

  • Huh, Sung-Min;Park, Chang-Mo;Jinho Ahn
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.1
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    • pp.39-43
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    • 2001
  • $SiC_{x}N$_{y}$ film is deposited by electron cyclotron resonance plasma chemical vapor deposition system using $SiH_4$(5% in Ar), $CH_4$ and $N_2$. Ternary phase $SiC_{x}N$_{y}$ thin film deposited at the microwave power of 600 W and substrate temperature of 700 contains considerable amount of strong C-N bonds. Change in $CH_4$flow rate can effectively control the residual film stress, and typical surface roughness of 34.6 (rms) was obtained. Extreme]y high hardness (3952 Hv) and optical transmittance (95% at 633 nm) was achieved, which is suitable for a LIGA mask membrane application.

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Kinetic Studies on the Reaction of 4-Substituted-2,6-dinitrochlorobenzenes with Substituted Anilines in MeOH-MeCN Mixtures (MeOH-MeCN 혼합용매계에서 4-치환-2,6-이니트로 염화벤젠과 아닐린 치환체와의 반응에 대한 속도론적 연구)

  • Dae-Ho Kang;In-Sun Koo;Jong Gun Lee;Ikchoon Lee
    • Journal of the Korean Chemical Society
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    • v.29 no.6
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    • pp.565-574
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    • 1985
  • The rates of reaction between 4-substituted-2,6-dinitrochlorobenzenes with para-substituted anilines in methanol-acetonitrile mixtures were measured by conductometry. It was observed that the rate constant increases in the order of X = 4-$NO_2 {\gg}4-CN {\gg}4- CF_3$, where X is a substituent in the substrate. The rate constant also increases in the order of Y = p-O$CH_3{\gg}p- CH_3{\gg}H {\gg}p-Cl{\gg}m- NO_2$, where Y is a substituent in the aniline ring. Kinetic studies in the methanol-acetonitrile solvent system with various nucleophiles showed that the N-C bond forming step is making a great contribution to the overall second order rate constant. The electrophilic catalysis by methanol probably consists of the hydrogen bonding between alcoholic hydrogen and leaving chloride in the transition state. The nucleophilic catalysis by methanol may be ascribed to the formation of hydrogen bonds between alcoholic oxygen and hydrogens of amines in the transition state. All these experimental facts are supporting the operation of $S_N$Ar machanism with the second step being the rate determining. This mechanism can be successfully fitted to the PES model.

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Residual gas analysis of small cavity for emissive flat panel display (미소체적을 갖는 평판표시소자용 패널내부의 잔류가스 분석)

  • 조영래;오재열;최정옥;김봉철;이병교;이진호;조경익
    • Journal of the Korean Vacuum Society
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    • v.10 no.1
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    • pp.9-15
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    • 2001
  • The total pressure and partial pressure of small cavity for flat panel display have been successfully measured by using an ultra-high vacuum chamber with mass spectrometer. The total pressure in the panel was in the range of $10^{-6}$ Torr and the major partial pressure affecting increase in total pressure were those of Ar, $CH_4$and He. The baking temperature during evacuation process was very important for high-vacuum package, the total pressure and partial pressure of $CH_4$ were decreased as the increase of baking temperature.

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Fabrication of high-k Zr silicate MIS and optimization of the etching process (High-k Zr silicate를 이용한 MIS 소자제작과 공정최적화)

  • 김종혁;송호영;오범환;이승걸;이일항;박재근
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.229-232
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    • 2002
  • In this paper, etching characteristics of Zr-silicate in Ar/ClrCH4 plasma is studied, and possible plasma damage is investigated by fabricating MIS capacitors. We'could increase the selectivity to near 2 while keeping the etch rate of Zr-silicate to about 70 nm/min. Leakage current and flat band voltage shift of PUZr-silicate/si capacitors are measured before and after plasma etching. Using capacitor patterns with the same area but different circumference lengths, we try to separate etching damage mechanisms and to optimize the process. The leakage current of 1.2$\times$10-3 A/cm2 and smaller capacitance variation of 0.2 nF at -2V are obtained in Ar/Cl2/CF4 plasma at 200 W RF power

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ZnO와 나노결정 다이아몬드 적층 박막의 SAW 필터 응용

  • Jeong, Du-Yeong;Kim, U-Hyeon;Gang, Chan-Hyeong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2008.11a
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    • pp.43-44
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    • 2008
  • 실리콘 웨이퍼 위에 마이크로웨이브 플라즈마 화학증착법으로 나노결정질 다이아몬드 박막을 형성하고 그 위에 RF 마그네트론 스퍼터로 ZnO 박막을 적층한 후 SAW(Surface Acoustic Wave) 필터를 제작하여 평가하였다. 기판온도, 작업압력, Ar/$CH_4$ 비율을 변화시켜 최적공정 조건에서 30nm 수준의 결정립을 갖는 $4{\mu}m$ 두께의 다이아몬드 박막을 얻었고, RF 인가전력, 기판온도, Ar/$O_2$ 비율을 조정하여 결정성이 우수하고, 표면 거칠기가 좋으며, 높은 비저항을 갖는 $2.2{\mu}m$ 두께의 ZnO 박막을 얻었다. 박막의 특성은 FESEM과 XRD로 평가하였다. Lift-off 식각공정을 이용하여 일정한 선폭과 간격(Line/Space : 1.5/$1.5{\mu}m$)을 갖는 구리 전극 패턴을 형성하였다. Network Analyzer를 이용하여 측정한 SAW 필터의 중심주파수는 1.67GHz이었다.

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Kinetic Investigation of CO2-CH4 Reaction over Ni/La2O3 Catalyst using Photoacoustic Spectroscopy

  • Oh, Hyun-Jin;Kang, Jin-Gyu;Heo, Eil;Lee, Sung-Han;Choi, Joong-Gill
    • Bulletin of the Korean Chemical Society
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    • v.35 no.9
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    • pp.2615-2620
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    • 2014
  • Ni/$La_2O_3$ with a high dispersion was prepared by reduction of $La_2O_3$ perovskite oxide to examine the catalytic activity for the $CO_2-CH_4$ reaction. The Ni/$La_2O_3$ catalyst was found to be highly active for the reaction. The ratios of $H_2$/CO were measured in a flow of the reaction mixture containing $CO_2/CH_4$/Ar using an on-line gas chromatography system operated at 1 atm and found to be varied with temperature between 0.66 and 1 in the temperature range of $500-800^{\circ}C$. A kinetic study of the catalytic reaction was performed in a static reactor at 40 Torr total pressure of $CO_2/CH_4/N_2$ by using a photoacoustic spectroscopy technique. The $CO_2$ photoacoustic signal varying with the concentration of $CO_2$ during the catalytic reaction was recorded as a function of time. Rates of $CO_2$ disappearance in the temperature range of $550-700^{\circ}C$ were obtained from the changes in the $CO_2$ photoacoustic signal at early reaction stage. The plot of ln rate vs. 1/T showed linear lines below and above $610^{\circ}C$. Apparent activation energies were determined to be 10.4 kcal/mol in the temperature range of $550-610^{\circ}C$ and 14.6 kcal/mol in the temperature range of $610-700^{\circ}C$. From the initial rates measured at $640^{\circ}C$ under various partial pressures of $CO_2$ and $CH_4$, the reaction orders were determined to be 0.43 with respect to $CO_2$ and 0.33 with respect to $CH_4$. The kinetic results were compared with those reported previously and used to infer a reaction mechanism for the Ni/$La_2O_3$-catalyzed $CO_2-CH_4$ reaction.

Chemopreventive Effects of Chelidonium majus L.(Papaveraceae) Herb Extract on Rat Gastric Carcinogenesis Induced by Ν-methyl-Ν-nitrosoguanidine(MNNG) and Hyoertonic Sodium Chloride

  • Kim, Dae-Joog;Lee, In-Seon
    • Preventive Nutrition and Food Science
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    • v.2 no.1
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    • pp.49-54
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    • 1997
  • The modifying effects of Chelidonium majus L/(Papaeracea)herb extract(CH) ,and analgesic traditionally prescribed for gastric and duodenal ulcer patients, on gastric tumor development given Ν-methyl-Ν'-nitro-Ν-nitrosogyanidine(MNNG) were studied in sixty-four 6 week-old male Wistar rats. Group 1 rats were ini-tially given MNNG(200mg/kg b/w.) by gavage ar days 0 and 14 as well as saturated sodium chloride solution(S-NaCI, 1ml per rat) every 3 days during weeks 0 to 3(6 times) and then placed on basal diet containing 0.1 or 0.2% CH ofr 16 weeks from week 4. Rats of Groups 2 and 3 were treated with MNNG together with S-NaCI or saline(0.9% NaCI, 21ml per rat) respectively, timed as in Group 1 but without further treatment. All survival animals were killed at week 20 and histopathologically investigate. in the glandular stomach, the number of preneoplastic pepsinogen 1 altered pyloric glands(PAPGs) in the MNNG+S-NaCI→CH(0.1%) group(Group 1) was significantly smaller than in the MNNG+S-NaCI group(Group 2)(p<0.02). The inci-dences of forestomach neoplastic lesions (Papillomas and squamous cell carcinomas)also showed a tendency for decrease with the CH treatment. The results thus indicate that C"H exerts inhibitory effects on glandular for decrease with the CH treatment. The results thus indicate that CH exerts inhibitory effects on glandular stomach carcinogenesis in the rat, so that it may have potential as a chemopreventive agent for stomach cancer in man.

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Fabrication and Characteristics of X-ray Position Detection Sensor (방사선 위치 검출센서의 제작 및 특성)

  • Park, Hyung-Jun;Kim, In-Su
    • Journal of IKEEE
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    • v.19 no.4
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    • pp.535-540
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    • 2015
  • A microstrip gas chamber (MSGC), applied to digital radiography system, was designed and constructed. The microstrip electrodes were fabricated with Chrome(Cr.). by photolithography process on Silicon(Si) wafer and glass substrate. The width of anode and cathode electrodes was $10{\mu}m$, and $290{\mu}m$, respectively. The distance of the electrodes was $100{\mu}m$, and the active area was $50{\times}50mm^2$. And the number of anode was 80. The microstrip electrodes were damaged when discharges occurred over the 600 V of anode voltage. As the result of experiments. It detected the typical output signals of the pulse width, 20 ns, under the condition that the detecting gas was Ar(90%) + $CH_4$(10%), X-ray tube voltage was 42 kV, and tube current was 1 mA.