• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.40 no.8
• /
• pp.565-571
• /
• 2003

We prepare the PVDF thin film using vacuum deposition method with the application of voltage and obtain the optimum deposition condition for $\beta$-PVDF thin film on the basis of the results of FT-IR, crystallinity of $\beta$ phase, surface roughness studies with varying the condition. The phase of PVDF thin film is analyzed by the FT-IR spectrum. When the substrate temperature and applied voltage increase from 3$0^{\circ}C$ to 9$0^{\circ}C$ and from 0kV to 9kV, respectively, the crystallinity of $\beta$ phase is introduced as large as 64%. It means that the substrate temperature and applied voltage allow the phase transition of $\beta$ phase to occur more easily. Also, the surface roughness of PVDF thin film decreases from 65.1nm to 36.6nm with the increase of substrate temperature. In results, we obtain the optimum deposition conditions for $\beta$-PVDF thin film from these experimental results and measure the Properties of the $\beta$-PVDF film deposited in the optimum condition. The dielectric properties such as dielectric constant and loss tangent decrease from 2.34 to 0.44 and from 0.27 to 0.04 with the increase of frequency, respectively.