• 한국전기전자재료학회논문지
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• 제23권11호
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• pp.859-863
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• 2010

Evolution of surface morphology of ${\alpha}-Al_2O_3$ substrate was investigated as a function of annealing temperature and time. Commercial (0001) ${\alpha}-Al_2O_3$ single crystal substrates were annealed in the range of $600-1000^{\circ}C$ in air. At $600^{\circ}C$, step-terrace structure started to be formed on the substrate. However, the surface roughness on the terrace was still considerable and a number of islands were observed on the step edges as well as the terraces. As the annealing temperature increased, the islands were absorbed into the step edges. Thus the terraces were smoother and the step edges were more straightened. Well-defined surface with a step height of 0.2 nm was formed above $900^{\circ}C$. On the other hand, when the substrate was annealed at a fixed temperature of $1000^{\circ}C$, the change of surface morphology was observed for the substrate annealed for 10 min. After the annealing for 30 min, the surface on which any islands could not survive was observed.

• 한국재료학회지
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• 제17권11호
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• pp.612-617
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• 2007

Both photoluminescence and thermal characteristics for $SrAl_2O_4:Eu^{+2},\;Dy^{+3}$ phosphors synthesized with various aluminum compounds (${\alpha}-Al_2O_3$, ${\gamma}-Al_2O_3$, amorphous-$Al_2O_3$ and $Al(OH)_3)$ were investigated in this study. The formation temperature of the host $SrAl_2O_4$ crystal is changed by these various aluminum compounds, as a result of the different thermal decomposition temperature of $SrCO_3$ phase. Among these compounds, the amorphous-$Al_2O_3$ phase shows the lowest formation temperature of the host $SrAl_2O_4$ crystal. The PL emission and excitation spectra of $SrAl_2O_4:Eu^{+2},\;Dy^{+3}$ phosphor are not affected by these aluminum compounds. After the removal of the Xenon lamp excitation (360 nm), however, the excellent longphosphorescent property of the phosphor is obtained by the amorphous-$Al_2O_3$ phase, although the decay time for all phosphors decrease exponentially.

• 대한화학회지
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• 제55권1호
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• pp.81-85
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• 2011

이소부탄의 산화탈수소반응(ODH)에 대한 $V_{0.9}Sb_{0.1}O_x$ 촉매계의 5가지 담지체의 촉진효과를 조사하였다. 사용된 5가지 담지체는 감마-알루미나, 알파-알루미나, 실리카-알루미나, 실리카겔, 마그네슘 산화물이다. 촉매는 사용된 담지체에 따라 그 효과가 다르게 나타났다: ${\gamma}-Al_2O_3$ > $\alpha$-$Al_2O_3$ > Si-Al-O> $SiO_2$ $\approx$MgO$\gg$unsupported. V-Sb-O 비율은 별로 촉매 활성과 선택성에 영향을 미치지 않았다. 촉매 성분들이 담지체에 골고루 잘 분포된 이유로 인해 감마-알루미나에 담지된 $V_{0.9}Sb_{0.1}O_x$ 촉매계가 성능이 제일 뛰어났다.

• 한국결정성장학회지
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• 제22권6호
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• pp.286-290
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• 2012

알루미늄 에칭 폐액으로부터 boehmite(AlOOH) 분말을 합성하였다. 폐액에서 침전되어 있는 결정상은 gibbsite ($Al(OH)_3$)였으며, 산을 이용하여 pH를 조절한 결과 pH가 7~8 영역에서 boehmite 결정상이 얻어졌다. 침전 분말에 남아 있는 Na 이온을 제거하고자 세척공정을 진행하여 boehmite 분말을 얻었다. 합성한 분말의 평균입경은 약 40 nm이었다. 또한 열처리 온도가 증가함에 따라 boehmite는 ${\gamma}-Al_2O_3$와 ${\delta}-Al_2O_3$, ${\Theta}-Al_2O_3$를 거쳐 ${\alpha}-Al_2O_3$ 결정상으로 상전이가 일어났다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.170-171
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• 2012

$Fe_2O_3$, Al, Cr과 Si 분말을 고 에너지 볼 밀링해서 나노분말을 제조한 후 고주파유도 가열 활성 연소합성 장치로 1분 이내의 짧은 시간에 합성 및 소결한 $Al_2O_3+4.65(Fe_{0.43}Cr_{0.17}Al_{0.323}Si_{0.077})$, $Al_2O_3$ + 5.33 ($Fe_{0.375}Cr_{0.11}Al_{0.3}Si_{0.075}$), $Al_2O_3$ + 6.15 ($Fe_{0.325}Cr_{0.155}Al_{0.448}Si_{0.072}$), $Al_2O_3$ + 3.3 ($Fe_{0.6}Cr_{0.3}Al_{0.6}$) 소결체 시편을 $700^{\circ}C$의 온도에서 100시간 동안 공기 중에서 산화 및 $N_2-H_20-H_2S$ 혼합 가스 내에서 황화 부식을 실시하였다. 그 결과 산화 및 황화 부식 후에 ${\alpha}-Al_2O_3$가 표면에 생성되어 보호 피막으로 작용하여 우수한 내식성을 보였다.

• 한국세라믹학회지
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• 제27권4호
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• pp.501-512
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• 1990

Al2O3 and 0.25wt% MgO-doped Al2O3 powders were made from the alcohol solution of Al(NO3)3.9H2O and Mg(NO3)2.6H2O by spray pyrolysis method. Each powder was prepared at 900 and 100$0^{\circ}C$. Powders prepared at 90$0^{\circ}C$ were amorphous phase, but prepared at 100$0^{\circ}C$ wre mainly ${\gamma}$-Al2O3 crystalline form. Particle size of the MgO-doped Al2O3 powders was in the range of 0.2-2${\mu}{\textrm}{m}$, but undooped powders shwoed comparatively wider range of particle size. All the powders prepared at 900 and 100$0^{\circ}C$ were transformed to $\alpha$-Al2O3 crystalline form by calcination at 110$0^{\circ}C$ for 1hr. Each powder was sintered at 1600, 1650 and 1$700^{\circ}C$ for 2hrs. MgO-doped Al2O3 body sintering at 1$650^{\circ}C$ showed 99% of relative density but undooped Al2O3 showed 95% of relative density, even sintered at higher temperature of 1$700^{\circ}C$.

• 대한화학회지
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• 제35권4호
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• pp.414-421
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• 1991

천연규산 알루미늄광인 힐로이사이트 광물로부터 고순도 ${\alpha}-Al_2O_3$를 합성하기 위해 황산용액을 사용한 습식합성법을 이용하였다. 추출된 황산 알루미늄 용액내에 존재하는 각종 불순물을 제거하기 위해 각 금속이온의 수산화물과 탄산화물의 형성을 고려, pH에 따른 용해도곡선을 도시하였다. 이를 기초로 ${\alpha}-Al_2O_3$의 전구물질인 순수한 암모니움 명반은 pH = 1.5∼2.5에서, 수산화 알루미늄은 pH = 6∼8에서 각각 합성하였으며, 이로부터 얻어진 ${\alpha}-Al_2O_3$의 순도는99.7${\%}$와 99.0${\%}$였다. 여기서 불순물에 대한 정제효과는 암모니움 명반으로부터 합성된 경우(Na = 0.047${\%}$, Si = 0.092${\%}$)가 수산화 알루미늄으로부터 합성된 경우Na = 0.29${\%}$, Si = 0.12${\%}$)보다 매우 높은 결과를 보였다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제8권1호
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• pp.40-45
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• 2008

We developed small molecular organic nonvolatile $4F^2$ memory cells using metal layer evaporation followed by $O_2$ plasma oxidation. Our memory cells sandwich an upper ${\alpha}$-NPD layer, Al nanocrystals surrounded by $Al_2O_3$, and a bottom ${\alpha}$-NPD layer between top and bottom electrodes. Their nonvolatile memory characteristics are excellent: the $V_{th},\;V_p$ (program), $V_e$ (erase), memory margin ($I_{on}/I_{off}$), data retention time, and erase and program endurance were 2.6 V, 5.3 V, 8.5 V, ${\approx}1.5{\times}10^2,\;1{\times}10^5s$, and $1{\times}10^3$ cycles, respectively. They also demonstrated symmetrical current versus voltage characteristics and a reversible erase and program process, indicating potential for terabit-level nonvolatile memory.

• 한국표면공학회지
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• 제52권5호
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• pp.246-250
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• 2019

Nano-multilayered $Cr_{25.2}Al_{19.5}Si_{4.7}N_{50.5}$ films were deposited on the steel substrate by cathodic arc plasma deposition. They were corroded at $900^{\circ}C$ in $Ar/1%SO_2$ gas in order to study their corrosion behavior in sulfidizing/oxidizing environments. Despite the presence of sulfur in the gaseous environment, the corrosion was governed by oxidation, leading to formation of protective oxides such as $Cr_2O_3$ and ${\alpha}-Al_2O_3$, where Si was dissolved. Iron diffused outward from the substrate to the film surface, and oxidized to $Fe_2O_3$ and $Fe_3O_4$. The films were corrosion-resistant up to 150 h owing to the formation of thin ($Cr_2O_3$ and/or ${\alpha}-Al_2O_3$)-rich oxide layers. However, they failed when corroded at $900^{\circ}C$ for 300 h, resulting in the formation of layered oxide scales due to not only outward diffusion of Cr, Al, Si, Fe and N, but also inward movement of sulfur and oxygen.

• 한국세라믹학회지
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• 제30권12호
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• pp.1089-1095
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• 1993

The $\alpha$-Al2O3 (1100) surfaces were studied with reflection electron microscopy (REM) technique. Severely faceted surfaces were found in the <1120> azimuth. Two methods were applied for indexing the facets. The facets are indexed as (1101) and vicinal facets of (1102), while the macroscopic plane is (1100).