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Study on a Real Time Quantitative Diagnostic Technique for Measuring CVD Precursors  

Yun Ju-Young (Vacuum Center, Korea Research Institute of Standards and Science)
Shin Yong-Hyoen (Vacuum Center, Korea Research Institute of Standards and Science)
Chung Kwang-Hwa (Vacuum Center, Korea Research Institute of Standards and Science)
Publication Information
Journal of the Korean Vacuum Society / v.14, no.3, 2005 , pp. 110-114 More about this Journal
Abstract
This study proposes an accurate method of monitoring precursor consumption in chemical vapor deposition (CVD) systems. Since precursor costs are significant, finding an efficient method to monitor precursor consumption is necessary One example is the use of non-contact and inexpensive ultrasonic sensors for determining the liquid level in a container. In this study, sensors based on ultrasonic techniques have been developed for monitoring the precursor consumption in a CVD system. Moreover, the prototype sensors developed in this study can be useful in the field of semiconductors.
Keywords
ultrasonic sensor; liquid level; CVD; precursor; semiconductor;
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