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Direct Patterning of 3D Microstructures on an Opaque Substrate Using Nano-Stereolithography  

Son, Yong (School of Mechanical Engineering & Aerospace System, KAIST)
Lim, Tae-Woo (School of Mechanical Engineering & Aerospace System, KAIST)
Ha, Cheol-Woo (School of Mechanical Engineering & Aerospace System, KAIST)
Yang, Dong-Yol (School of Mechanical Engineering & Aerospace System, KAIST)
Jung, Byung-Je (Department of Physics, KAIST)
Kong, Hong-Jin (Department of Physics, KAIST)
Publication Information
Journal of the Korean Society for Precision Engineering / v.27, no.10, 2010 , pp. 93-99 More about this Journal
Abstract
A nano-stereolithography is the direct patterning process with a nanoscale resolution using twophoton absorption induced by a femtosecond laser. However, in the majority of the works, the fabrication of 3D microstructures have been done only onto transparent glass due to the use of an oil immersion objective lens for achieving a high resolution. In this work, the coaxial illumination and the auto-focusing system are proposed for the direct patterning of nano-precision patterns on an opaque substrate such as a silicon wafer and a metal substrate. Through this work, 3D polymer structures and metallic patterns are fabricated on a silicon wafer using the developed process.
Keywords
Nano-Stereolithography; Two-photon Absorption; Femtosecond Laser; Opaque Substrate;
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Times Cited By KSCI : 3  (Citation Analysis)
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