Browse > Article
http://dx.doi.org/10.4313/JKEM.2013.26.1.56

The Properties of ZnO:Ga,In(IGZO) Thin Films Prepared by RF Magnetron Sputtering  

Kim, Hyoung Min (Department of Semiconductor Engineering, Gyeongsang National University)
Ma, Tae Young (Department of Electrical Engineering, Gyeongsang National University)
Park, Ki Cheol (Department of Semiconductor Engineering, Gyeongsang National University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.26, no.1, 2013 , pp. 56-63 More about this Journal
Abstract
IGZO thin films have been prepared by RF magnetron sputtering. The structural, electrical and optical properties of the IGZO thin films have been investigated as a function of deposition condition. XRD analysis of IGZO thin films showed a typical crystallographic orientation with c-axis perpendicular regardless of deposition conditions. The carrier mobility, carrier concentration and resistivity of the IGZO films sputtered at 200 W, 1mTorr and $300^{\circ}C$ were $28.5cm^2/V{\cdot}sec$, $2.6{\times}10^{20}cm^3$, $8.8{\times}10^{-4}{\Omega}{\cdot}cm$ respectively. The optical transmittance were higher than 80% at visible region regardless of the deposition conditions under the experiments above, and specifically higher than 90% at wave length over 500 nm. The absorption edge was shifted to shorter wavelength with increase of carrier concentration.
Keywords
IGZO thin film; RF magnetron sputtering; Structural; Electrical and optical properties;
Citations & Related Records
연도 인용수 순위
  • Reference
1 J. Hamberg and C. G. Granqvist, J. Appl. Phys., 60, R123 (1986).   DOI
2 K. L. Chopla, S. Major, and D. K. Pandya, Thin Solid Films, 102, 1 (1983).   DOI   ScienceOn
3 J. Y. Tseng, Y. T. Chen, M. Y. Yang, C. Y. Yang, P. C. Li, W. C. Yu, Y. F Hsu, and S. F. Wang, Thin Solid Films, 517, 6310 (2009).   DOI   ScienceOn
4 Sim, K. U. Shin, S. W. Moholkar, A. V. Yun, J. H. Moon, J. H. Kim, and J. H, J. Appl. Phys., 10, 1016 (2010).
5 K .C. Park, D. Y. Ma, and K. H. Kim, Thin Solid Films, 81, 7764 (1997).
6 H. G. Lee, Master Thesis, Gyeongsang National University, Jinju (1996).
7 K. C. Park, H. K. Lee, T. Y. Ma, and K. H. Kim, Ungyong Mulli, 9, 450 (1996).
8 B. H. Choi, H.B. Im, J. S. Song, and K. H. Yoon, Thin Solid Films, 193, 712 (1990).   DOI   ScienceOn
9 R. F. Bunshah, Deposition Technologies for Films and Coating (Noyes Publications, 1982) p. 129.
10 X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang. C. Cheng, and H. Ma, J. Crystal. Growth, 274, 474 (2005).   DOI   ScienceOn
11 J. Y. W. Seto, J. Appl. Phys., 46, 5247 (1975).   DOI   ScienceOn
12 Y. Igasaki and H. Saito, J. Appl. Phys., 70, 3613 (1991).   DOI
13 J. K. Sheu, K. W. Shu, M. L. Lee, C. J. Tun, and G. C. Chic, J. Ele. Soc., 154 (1991).
14 E. Burstein, Phys. Rev., 93, 632 (1981).