Browse > Article
http://dx.doi.org/10.5369/JSST.2005.14.6.374

Fabrication and characteristics of vibration sensor using conductive ball  

Jang, Sung-Wook (Department of Sensor and Display Engineering, Kyungpook National University)
Cho, Yong-Soo (Department of Electronics, Kyungpook National University)
Kong, Seong-Ho (Department of Electronics, Kyungpook National University)
Choi, Sie-Young (Department of Electronics, Kyungpook National University)
Publication Information
Journal of Sensor Science and Technology / v.14, no.6, 2005 , pp. 374-380 More about this Journal
Abstract
Vibration sensors have a wide scope of applications in the field of monitoring systems that needs to perceive an undesirable physical vibration before a critical failure occurs in a system, and then costly unplanned repairs can be avoided. The conventional vibration sensors developed so far have many disadvantages, such as complex manufacturing process, bulkiness, high cost, less reliability and so on. This paper reports a simple-structured vibration sensor, which has been developed using a commercialized conductive ball and silicon bulk-micromachining technology. The sensor consists of a conductive ball placed in $600{\mu}m$-deep micromachined silicon groove, in which Au thin film has been patterned using a shadow mask technique. Prior to the formation of the Au thin film, the sharp convex corner was rounded for smooth meatl deposition on the non-planar surface at the edge of the groove. The measurement results of the fabricated vibration sensor demonstrate a stable response characteristic to low-frequency vibration range ($1{\sim}30{\;}Hz$).
Keywords
vibration sensor; side-wall patterning; KOH; micromachining;
Citations & Related Records
연도 인용수 순위
  • Reference
1 O. N. Tufte, P. W. Chapman, and D. Long, 'Silicon diffused element piezoresistive diaphragms', J. Appl, Phys., vol. 33, no. 11, pp. 3322-3327, 1962   DOI
2 E. Bassous, 'Fabrication of novel three-dimensional microstructures by the anisotropic etching of (100) and (110) silicon', IEEE Trans. on Electron Devices, vol. ED-25, no. 10
3 E. D. Palik, V. M. Bermudez, and O. J. Glembocki, 'Ellipsometry study of orientation-dependent etching of silicon in aqueous KOH', J. Electrochem. Soc.: Solid-State Science and Technology, vol. 132, no. 4, pp. 871-884, 1985
4 X. P. Wu, Q. H. Wu, and W. H. Ko, 'A study on deep etching of silicon using ethylene-diamine-pyrocatechol-water', Sensors and Actuators, vol. 9, pp. 333-343, 1986   DOI   ScienceOn
5 E. Bassous, 'Fabrication of novel three-dimensional microstructures by the anisotropic etching of (100) and (110) silicon', IEEE Trans. on Electron Devices, vol. ED-25, no. 10, pp. 1178-1184, 1978
6 김동진, 김우정, 최시영, '실리콘 마이크로머시닝과 RIE를 이용한 가속도센서의 제조', 센서학회지, 제 6권, 제 l호, pp. 430-436, 1997
7 심준환, 김동기, 조찬섭 , 태흥식, 함성호, 이종현, '선택적인 다공질 실리콘 에칭법을 이용한 압저항형 실리콘 가속도센서의 제조', 센서학회지, 제5권, 제5호, pp. 21-29, 1996
8 G J. Burger, E. J. T. Smulders, J. W. Berenschot, T. S. J. Lammerink, 1. H. J. Fluitman, and S. Imai, 'High-resolution shadow mask patterning in deep holes and its application to an electrical water feed-through', Sensors and Acturators, vol. A54, pp. 669-673, 1996
9 M. Mehregany et al., 'Anisotropic etching of silicon in hydrazine', Sensors and Actuators, vol. 13, pp. 375-390, 1986   DOI   ScienceOn