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http://dx.doi.org/10.3807/JOSK.2013.17.1.038

Determination of Optical Constants of Thin Films in Extreme Ultraviolet Wavelength Region by an Indirect Optical Method  

Kang, Hee Young (Department of Physics, Inha University)
Lim, Jai Dong (Department of Physics, Inha University)
Peranantham, Pazhanisami (Department of Physics, Inha University)
HwangBo, Chang Kwon (Department of Physics, Inha University)
Publication Information
Journal of the Optical Society of Korea / v.17, no.1, 2013 , pp. 38-43 More about this Journal
Abstract
In this study, we propose a simple and indirect method to determine the optical constants of Mo and ITO thin films in the extreme ultraviolet (EUV) wavelength region by using X-ray reflectometry (XRR) and Rutherford backscattering spectrometry (RBS). Mo and ITO films were deposited on silicon substrates by using an RF magnetron sputtering method. The density and the composition of the deposited films were evaluated from the XRR and RBS analysis, respectively and then the optical constants of the Mo and ITO films were determined by an indirect optical method. The results suggest that the indirect method by using the XRR and RBS analysis will be useful to search for suitable high absorbing EUVL mask material quickly.
Keywords
X-ray reflectometry; Optical constant; Extreme ultraviolet lithography;
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Times Cited By KSCI : 1  (Citation Analysis)
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