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http://dx.doi.org/10.4150/KPMI.2016.23.1.21

Characterization of Films Sputtered with the Cu-Ga Target Prepared by the Cold Spray Process  

Cho, Youngji (Department of Measurement & Analysis, National Nanofab Center)
Yoo, Jung Ho (Department of Measurement & Analysis, National Nanofab Center)
Yang, Jun-Mo (Department of Measurement & Analysis, National Nanofab Center)
Park, Dong-Yong (Taekwang Tech Co. Ltd.)
Kim, Jong-Kyun (Chang Shung Co. Ltd.)
Choi, Gang-Bo (Chang Shung Co. Ltd.)
Chang, Jiho (Department of Applied Science, Korea Maritime and Ocean University)
Publication Information
Journal of Powder Materials / v.23, no.1, 2016 , pp. 21-25 More about this Journal
Abstract
The microstructural properties and electrical characteristics of sputtering films deposited with a Cu-Ga target are analyzed. The Cu-Ga target is prepared using the cold spray process and shows generally uniform composition distributions, as suggested by secondary ion mass spectrometer (SIMS) data. Characteristics of the sputtered Cu-Ga films are investigated at three positions (top, center and bottom) of the Cu-Ga target by X-ray diffraction (XRD), SIMS, 4-point probe and transmission electron microscopy (TEM) analysis methods. The results show that the Cu-Ga films are composed of hexagonal and unknown phases, and they have similar distributions of composition and resistivity at the top, center, and bottom regions of the Cu-Ga target. It demonstrates that these films have uniform properties regardless of the position on the Cu-Ga target. In conclusion, the cold spray process is expected to be a useful method for preparing sputter targets.
Keywords
Solar cell; CIGS; Cu-Ga sputtering target; Cold spray process; Characterization;
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Times Cited By KSCI : 1  (Citation Analysis)
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