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Study on Analysis of Optical Deflection of Laser Scattering Based on Rayleigh Criterion for Crystalline Silicon Wafer in Solar Cell  

Kim, Gyung-Bum (Aeronautical & Mechanical Design Engineering, Chungju National University)
Publication Information
Journal of the Semiconductor & Display Technology / v.9, no.4, 2010 , pp. 31-37 More about this Journal
Abstract
In this paper, optical deflection of laser scattering has been investigated based on Rayleigh criterion for crystalline silicon wafer in solar cell. A laser scattering mechanism is newly designed using light scattering properties in silicon wafer. Intensity distributions of laser scattering are different, depending on the incident angle of laser computed from Rayleigh criterion. In case of the incident angle satisfied with the criterion, they are asymmetric. Also, their specular reflection angle is shifted to unpredicted ones. These phenomena are in accordance with previous theories of laser scattering. The optical deflection of laser scattering is experimentally identified with the designed laser scattering mechanism. Its mathematical model is presented from the geometric relationship of laser scattering. It is shown that the optical deflection of laser scattering agree with the presented model, exclusive of grazing angles which is satisfied with Rayleigh criterion.
Keywords
Crystalline silicon wafer; Laser scattering; Optical deflection; Rayleigh criterion; Solar cell;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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1 Lee, J. H., "Current Status and Future Prospects of Solar Cell, " KSPE, Vol. 25, No. 10, pp. 7-22, 2008.   과학기술학회마을
2 Byelyayev, A., "Stress Diagnostics and Crack Detection in Full-size Silicon Wafers using Resonance Ultrasonic Vibrations," Department of Electrical Engineering, Ph. D, University of South Florida, 2005.
3 Takami, K., "Defect Inspection of Wafers by Laser Scattering," Materials Science & Engineering, Vol. 44, pp. 181-187, 1997.   DOI   ScienceOn
4 Chang, C. Y. and Li, C., "An Supervised Neural Network Approach for Automatic Semiconductor Wafer Defect Inspection," Expert Systems with Applications, Vol. 36, pp. 950-958, 2009.   DOI   ScienceOn
5 Hong, Y. K. and Kim, G. B., "A Study on the Experimental Identification of Surface Roughness using Laser Scattering Image," The Korean Society of Mechanical Engineers , Vol. 1, pp. 35-41, 2010.   과학기술학회마을   DOI   ScienceOn
6 John, C. Stover, "Optical Scattering Measurement and Analysis 2nd Edition," SPIE Press, 1995.
7 Bakolias, C., "Oblique Imaging of Scattered Light for Surface Inspection," Department of Mechanical Engineering, Ph. D, London University, 1996.
8 Nayar, S. K., Ikeuchi, K. and Kanade, T., "Surface Reflection: Physical and Geometrical Perspectives," IEEE Pattern Analysis and Machine Intelligence, Vol. 13, Issue 7, pp. 611-634, 1991.   DOI   ScienceOn
9 Ha, T. H., "A Study on Light Scattering Characteristics of CMP-induced on Silicon Oxide Wafer Surface for Defects Detection and Classification," Department of Mechanical Engineering and System, Ph. D, Osaka university, 2007.
10 Kim, G. B., "A structured mechanism development and experimental parameter selection of laser scattering for the surface inspection of flat-panel glasses," International Journal of Production Research, Vol. 48, Issue. 13, pp. 3911-3923, 2010.   DOI   ScienceOn
11 http://www.nexolon.com
12 James, E. Harvey, Andrey Krywonos and Cynthia L. Vernold, "Modified Beckmann-Kirchhoff Scattering Theory for Rough Surfaces with Large Scattering and Incident Angles," Applied Optics, pp.1-12, 2006.