Current Photovoltaic Research

  • 제12권3호
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  • Pages.55-60
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  • 2024
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  • 2288-3274(pISSN)
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  • 2508-125X(eISSN)
한국태양광발전학회 (Korea Photovoltaic Society)
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n형 양면 결정질 실리콘 태양전지의 SiNx/SiOx 이중층 영향에 관한 연구

Effect on the Double Stacked SiNX/SiOX Layers for n-type Bifacial Crystalline Silicon Solar Cells

  • 박형기 (재생에너지학과, 사마르칸트 국제 기술 대학) ;
  • 박진주 (에너지융합공학과, 청주대학교) ;
  • 이준신 (정보통신대학, 성균관대학교)
  • Hyeong Gi Park (Department of Renewable Energy, Samarkand International University of Technology (SIUT)) ;
  • Jinjoo Park (Department of Energy Convergence, Cheongju University) ;
  • Junsin Yi (College of Information and Communication Engineering, Sungkyunkwan University)
  • 투고 : 2024.08.30
  • 심사 : 2024.09.19
  • 발행 : 2024.09.30
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초록

This study explored the effect of double-stacked SiOX/SiNX layers on the passivation quality of n-type bifacial crystalline Si solar cells. SiOX layers were deposited via PECVD under various conditions on n-type silicon wafers with a boron emitter. These layers were capped with SiNX and thermally treated to optimize the passivation. The optimal conditions resulted in a minority-carrier lifetime of 268 μsec and an implied VOC of 692 mV. The optimized SiOX layer had a low interface defect density and high fixed negative charge. When applied to n-type solar cells, the SiOX/SiNX stack improved the performance, achieving a VOC of 646 mV, JSC of 39.3 mA/cm2, FF of 78.06%, and efficiency of 19.82%, demonstrating the potential for higher efficiency in n-type silicon solar cells.

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참고문헌

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