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A pilot study of half-value layer measurements using a semiconductor dosimeter for intraoral radiography

  • Shun Nouchi (Department of Radiology, The Nippon Dental University Niigata Hospital) ;
  • Hidenori Yoshida (Department of Radiological Technology, Niigata University of Health and Welfare) ;
  • Yusaku Miki (Department of Radiology, The Nippon Dental University Niigata Hospital) ;
  • Yasuhito Tezuka (Department of Oral and Maxillofacial Radiology, The Nippon Dental University School of Life Dentistry at Niigata) ;
  • Ruri Ogawa (Department of Oral and Maxillofacial Radiology, The Nippon Dental University School of Life Dentistry at Niigata) ;
  • Ichiro Ogura (Department of Radiology, The Nippon Dental University Niigata Hospital)
  • 투고 : 2023.02.14
  • 심사 : 2023.05.12
  • 발행 : 2023.09.30

초록

Purpose: This pilot study was conducted to evaluate half-value layer (HVL) measurements obtained using a semiconductor dosimeter for intraoral radiography. Materials and Methods: This study included 8 aluminum plates, 4 of which were low-purity (less than 99.9%) and 4 high-purity (greater than 99.9%). Intraoral radiography was performed using an intraoral X-ray unit in accordance with the dental protocol at the authors' affiliated hospital: tube voltage, 60 kVp and 70 kVp; tube current, 7 mA; and exposure time, 0.10 s. The accuracy of HVL measurements for intraoral radiography was assessed using a semiconductor dosimeter. A simple regression analysis was performed to compare the aluminum plate thickness and HVL in relation to the tube voltage (60 kVp and 70 kVp) and aluminum purity (low and high). Results: For the low-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the thickness of the aluminum plate (X), with Y=1.708+0.415X (r=0.999, P<0.05) and Y=1.980+0.484X (r=0.999, P<0.05), respectively. Similarly, for the high-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the plate thickness(X), with Y=1.696+0.454X (r=0.999, P<0.05) and Y=1.968+0.515X (r=0.998, P<0.05), respectively. Conclusion: This pilot study examined the relationship between aluminum plate thickness and HVL measurements using a semiconductor dosimeter for intraoral radiography. Semiconductor dosimeters may prove useful in HVL measurement for purposes such as quality assurance in dental X-ray imaging.

키워드

참고문헌

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