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Effect of Rapid Thermal Annealing on the Transparent Conduction and Heater Property of ZnO/Cu/ZnO Thin Films

RTA 후속 열처리에 따른 ZnO/Cu/ZnO 박막의 투명전극 및 발열체 특성 연구

  • Yeon-Hak Lee (School of Materials Science and Engineering, University of Ulsan) ;
  • Daeil Kim (School of Materials Science and Engineering, University of Ulsan)
  • 이연학 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2023.04.28
  • Accepted : 2023.05.15
  • Published : 2023.05.30

Abstract

ZnO/Cu/ZnO (ZCZ) thin film deposited on the glass substrate with DC and RF magnetron sputtering was rapid thermal annealed (RTA) and then effect of thermal temperature on the opto-electical and transparent heater properties of the films were considered. The visible transmittance and electrical resistivity are depends on the annealing temperature. The electrical resistivity decreased from 1.68 × 10-3 Ωcm to 1.18 × 10-3 Ωcm and the films annealed at 400℃ show a higher transmittance of 78.5%. In a heat radiation test, when a bias voltage of 20 V is applied to the ZCZ film annealed at 400℃, its steady state temperature is about 70.7℃. In a repetition test, the steady state temperature is reached within 15s for all of the bias voltages.

Keywords

References

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