한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제56권2호
  • /
  • Pages.147-151
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  • 2023
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
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ZnO/Ti/ZnO 박막의 결정성 및 전기광학적 완성도 개선 연구

Enhancements of Crystallization and Opto-Electrical performance of ZnO/Ti/ZnO Thin Films

  • 장진규 (울산대학교 첨단소재공학부) ;
  • 김유성 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 이연학 (울산대학교 첨단소재공학부) ;
  • 최진영 (울산대학교 첨단소재공학부) ;
  • 이인식 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 김대욱 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 차병철 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 공영민 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Jin-Kyu Jang (School of Materials Science and Engineering, University of Ulsan) ;
  • Yu-Sung Kim (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Yeon-Hak Lee (School of Materials Science and Engineering, University of Ulsan) ;
  • Jin-Young Choi (School of Materials Science and Engineering, University of Ulsan) ;
  • In-Sik Lee (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Dae-Wook Kim (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Byung-Chul Cha (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Young-Min Kong (School of Materials Science and Engineering, University of Ulsan) ;
  • Daeil Kim (School of Materials Science and Engineering, University of Ulsan)
  • 투고 : 2023.02.22
  • 심사 : 2023.03.23
  • 발행 : 2023.04.30
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초록

Transparent ZnO (100 nm thick) and ZnO/Ti/ZnO (ZTZ) films were prepared with radio frequency (RF) and direct current (DC) magnetron sputtering on the glass substrate at room temperature. During the ZTZ film deposition, the thickness of the Ti interlayer was varied, such as 6, 9, 12, and 15 nm, while the thickness of ZnO films was kept at 50 nm to investigate the effect of the Ti interlayer on the crystallization and opto-electrical performance of the films. From the XRD pattern, it is concluded that the 9 nm thick Ti interlayer showed some characteristic peaks of Ti (200) and (220), and the grain size of the ZnO (002) enlarged from 13.32 to 15.28 nm as Ti interlayer thickness increased. In an opto-electrical performance observation, ZnO single-layer films show a figure of merit of 1.4×10-11 Ω-1, while ZTZ films with a 9 nm-thick Ti interlayer show a higher figure of merit of 2.0×10-5 Ω-1.

키워드

과제정보

본 논문은 한국생산기술연구원 기관주요사업 "IMO대응 LNG선박 극저온 연료탱크 스마트 제조 기술개발(4/6)(JA-23-0003)"의 지원으로 수행한 연구입니다.

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