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Mechanical and Structural Behaviors of HfN Thin Films Fabricated by Direct Current and Mid-frequency Magnetron Sputtering

  • Sung-Yong Chun (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • Received : 2022.12.13
  • Accepted : 2022.12.26
  • Published : 2023.03.02

Abstract

Hafnium nitride (HfN) thin films were fabricated by mid-frequency magnetron sputtering (mfMS) and direct current magnetron sputtering (dcMS) and their mechanical and structural properties were compared. In particular, changes in the HfN film properties were observed by changing the pulse frequency of mfMS between 5 kHz, 15 kHz, and 30 kHz. The crystalline structure, microstructure, 3D morphology, and mechanical properties of the HfN films were compared by x-ray diffraction, field-emission scanning electron microscopy, atomic force microscopy, and nanoindentation tester, respectively. HfN film deposited by mfMS showed a smoother and denser microstructure as the frequency increased, whereas the film deposited by dcMS showed a rough and sloppy microstructure. A single δ-HfN phase was observed in the HfN film made by mfMS with a pulse frequency of 30 kHz, but mixed δ-HfN and HfN0·4 phases were observed in the HfN film made by dcMS. The mechanical properties of HfN film made by mfMS were improved compared to film made by dcMS.

Keywords

Acknowledgement

This Research was supported by Research Funds of Mokpo National University in 2022.

References

  1. S. Y. Chun, S. J. Kim, Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering, Corrosion Science and Technology, 20, 112 (2021). Doi: https://doi.org/10.14773/cst.2021.20.3.112
  2. S. Y. Chun, S. W. Park, A Comparative Study of CrN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Sputtering for a Polymer Electrolyte Membrane Fuel Cell (PEMFC) Metallic Bipolar Plate, Journal of the Korean Ceramic Society, 50, 390 (2013). Doi: https://doi.org/10.4191/kcers.2013.50.6.390
  3. S. Y. Chun, J. Y. Hwang, Effects of Duty Cycle and Pulse Frequency on the Microstructure and Mechanical Properties of TiAlN Coatings, Journal of the Korean Ceramic Society, 51, 447 (2014). Doi: https://doi.org/10.4191/kcers.2014.51.5.447
  4. Y. S. Fang, K. A. Chiu, H. Do, L. Chang, Reactive sputtering for highly oriented HfN film growth on Si (100) substrate, Surface and Coatings Technology, 377, 124877 (2019). Doi: https://doi.org/10.3390/coatings10070647
  5. R. Armitage, Q. Yang, H. Feick, J. Gebauer, E. R. Weber, Lattice-matched HfN buffer layers for epitaxy of GaN on Si, Applied Physics Letters, 81, 1450 (2002). Doi: https://doi.org/10.1063/1.1501447
  6. J. J. Oakes, A comparative evaluation of HfN, Al2O3, TiC and TiN coatings on cemented carbide tools, Thin Solid Films, 107, 159 (1983). Doi: https://doi.org/10.1016/0040-6090(83)90018-4
  7. X. M. Cai, F. Ye, E.Q. Xie, D.P. Zhang, P. Fan, Field electron emission from HfNxOy thin films deposited by direct current sputtering, Applied Surface Science, 254, 3074 (2008). Doi: https://doi.org/10.1016/j.apsusc.2007.10.058
  8. I.E. Fragkos, N. Tansu, Surface plasmon coupling in GaN:Eu light emitters with metal-nitrides, Scientific Reports, 8, 13365 (2018). Doi: https://doi.org/10.1038/s41598-018-31821-8
  9. S. Y. Tan, X. H. Zhang, X. J. Wu, F. Fang, J. Q. Jiang, Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering, Thin Solid Films, 519, 2116 (2011). Doi: https://doi.org/10.1016/j.tsf.2010.10.067
  10. R. D. Arnell, P. J. Kelly, J. W. Bradley, Recent developments in pulsed magnetron sputtering, Surface and Coatings Technology, 188-189, 158 (2004). Doi: https://doi.org/10.1016/j.surfcoat.2004.08.010
  11. R. Nowak, S. Maruno, Surface deformation and electrical properties of HfN thin films deposited by reactive sputtering, Materials Science and Engineering: A, 202, 226 (1995). Doi: https://doi.org/10.1016/0921-5093(95)09814-3
  12. B. H. Hwang, S. Y. Chiou, An XRD study of highly textured HfN films, Thin Solid Films, 304, 286 (1997). Doi: https://doi.org/10.1016/S0040-6090(97)00106-5
  13. W. Tillmann, N. F. L. Dias, D. Stangier, M. Tolan, M. Paulus, Structure and mechanical properties of hafnium nitride films deposited by direct current, mid-frequency, and high-power impulse magnetron sputtering, Thin Solid Films, 669, 65 (2019). Doi: https://doi.org/10.1016/j.tsf.2018.10.035
  14. B. D. Cullity and S. R. Stock, Elements of X-Ray Diffraction, 3rd. ed., pp. 167 - 171, Prentice-Hall Inc., New York (2001).
  15. I. Petrov, P. B. Barna, L. Hultman, J. E. Greene, J. Vac. Microstructural evolution during film growth, Sci. Tech. A, 21, S117 (2003). Doi: https://doi.org/10.1116/1.1601610
  16. D. O. Thorsteinsson and J. T. Gudmundsson, Growth of HfN thin films by reactive high power impulse magnetron sputtering, AIP Advances, 8, 035124 (2018). Doi: https://doi.org/10.1063/1.5025553
  17. J. Lin, I. Dahan, B. Valderrama, and M. V. Manuel, Structure and Properties of Uranium Oxide Thin Films Deposited by Pulsed DC Magnetron Sputtering, Applied Surface Science, 301, 475 (2014). Doi: https://doi.org/10.1016/j.apsusc.2014.02.106