Acknowledgement
This Research was supported by Research Funds of Mokpo National University in 2022.
References
- S. Y. Chun, S. J. Kim, Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering, Corrosion Science and Technology, 20, 112 (2021). Doi: https://doi.org/10.14773/cst.2021.20.3.112
- S. Y. Chun, S. W. Park, A Comparative Study of CrN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Sputtering for a Polymer Electrolyte Membrane Fuel Cell (PEMFC) Metallic Bipolar Plate, Journal of the Korean Ceramic Society, 50, 390 (2013). Doi: https://doi.org/10.4191/kcers.2013.50.6.390
- S. Y. Chun, J. Y. Hwang, Effects of Duty Cycle and Pulse Frequency on the Microstructure and Mechanical Properties of TiAlN Coatings, Journal of the Korean Ceramic Society, 51, 447 (2014). Doi: https://doi.org/10.4191/kcers.2014.51.5.447
- Y. S. Fang, K. A. Chiu, H. Do, L. Chang, Reactive sputtering for highly oriented HfN film growth on Si (100) substrate, Surface and Coatings Technology, 377, 124877 (2019). Doi: https://doi.org/10.3390/coatings10070647
- R. Armitage, Q. Yang, H. Feick, J. Gebauer, E. R. Weber, Lattice-matched HfN buffer layers for epitaxy of GaN on Si, Applied Physics Letters, 81, 1450 (2002). Doi: https://doi.org/10.1063/1.1501447
- J. J. Oakes, A comparative evaluation of HfN, Al2O3, TiC and TiN coatings on cemented carbide tools, Thin Solid Films, 107, 159 (1983). Doi: https://doi.org/10.1016/0040-6090(83)90018-4
- X. M. Cai, F. Ye, E.Q. Xie, D.P. Zhang, P. Fan, Field electron emission from HfNxOy thin films deposited by direct current sputtering, Applied Surface Science, 254, 3074 (2008). Doi: https://doi.org/10.1016/j.apsusc.2007.10.058
- I.E. Fragkos, N. Tansu, Surface plasmon coupling in GaN:Eu light emitters with metal-nitrides, Scientific Reports, 8, 13365 (2018). Doi: https://doi.org/10.1038/s41598-018-31821-8
- S. Y. Tan, X. H. Zhang, X. J. Wu, F. Fang, J. Q. Jiang, Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering, Thin Solid Films, 519, 2116 (2011). Doi: https://doi.org/10.1016/j.tsf.2010.10.067
- R. D. Arnell, P. J. Kelly, J. W. Bradley, Recent developments in pulsed magnetron sputtering, Surface and Coatings Technology, 188-189, 158 (2004). Doi: https://doi.org/10.1016/j.surfcoat.2004.08.010
- R. Nowak, S. Maruno, Surface deformation and electrical properties of HfN thin films deposited by reactive sputtering, Materials Science and Engineering: A, 202, 226 (1995). Doi: https://doi.org/10.1016/0921-5093(95)09814-3
- B. H. Hwang, S. Y. Chiou, An XRD study of highly textured HfN films, Thin Solid Films, 304, 286 (1997). Doi: https://doi.org/10.1016/S0040-6090(97)00106-5
- W. Tillmann, N. F. L. Dias, D. Stangier, M. Tolan, M. Paulus, Structure and mechanical properties of hafnium nitride films deposited by direct current, mid-frequency, and high-power impulse magnetron sputtering, Thin Solid Films, 669, 65 (2019). Doi: https://doi.org/10.1016/j.tsf.2018.10.035
- B. D. Cullity and S. R. Stock, Elements of X-Ray Diffraction, 3rd. ed., pp. 167 - 171, Prentice-Hall Inc., New York (2001).
- I. Petrov, P. B. Barna, L. Hultman, J. E. Greene, J. Vac. Microstructural evolution during film growth, Sci. Tech. A, 21, S117 (2003). Doi: https://doi.org/10.1116/1.1601610
- D. O. Thorsteinsson and J. T. Gudmundsson, Growth of HfN thin films by reactive high power impulse magnetron sputtering, AIP Advances, 8, 035124 (2018). Doi: https://doi.org/10.1063/1.5025553
- J. Lin, I. Dahan, B. Valderrama, and M. V. Manuel, Structure and Properties of Uranium Oxide Thin Films Deposited by Pulsed DC Magnetron Sputtering, Applied Surface Science, 301, 475 (2014). Doi: https://doi.org/10.1016/j.apsusc.2014.02.106