References
- 김곤호, 양성채, 플라즈마 일렉트로닉스, 교학사 (2006).
- 염근영, 플라즈마 식각기술, 미래컴 (2006).
- 정진욱, 플라즈마 전자공학, 청문각 (2013).
- M. A. Lieberman and A. J. Lichitenberg, Principles of Plasma Discharges and Materials Processing, Wiley, New York (2005).
- F. F. Chen, Plasma Physics and Controlled Fusion, Plenum Press, New York (1984).
- L. Tonks and I. Langmuir, Phys. Rev. 34, 876 (1929).
- J. R. Roth, Industrial Plasma Engineering (IOP., Bristol, 1995), Vol.1.
- J. W. Coburn and H. F. Winters, Ann. Rev. Mater. Sci. 13, 91 (1983).
- 한국산업기술평가원, PD ISSUE REPORT, 17(4), 55 (2017).
- M. Sugawara, Plasma Etching-Fundamentals and Applications, Oxford, (1998).
- H. Dun, P. Pan, F. R. White and R. W. Douse, J. Electrochem. Soc. 128, 1556(1981).
- "Cyber-Physical System", Wikipedia
- 디지털타임스, 2018.8.28 기사
- KIPOST, 2018.9.10 기사
- McKinsey, 2017 보고서
- Fukasawa M., Kawashima A., Kuboi N., Takagi H., Tanaka Y., Sakayori H., Oshima K., Nagahata K. and Tatsumi T, Jpn. J. Appl. Phys. 48, 08HC01 (2009).
- J. Moyne, J. Samantaray and M. Armacost, IEEE Trans. Semicond. Manuf. 29, 283 (2016).
- Andrew Ng. Machine Learning Yearning, (e-book, deeplearning.ai), p19 (2018),
- IBM Research, 2016 SEMICON West