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A comparative study of electrochemical properties in CrN films prepared by inductively coupled plasma magnetron sputtering

유도결합형 플라즈마 마그네트론 스피터로 제작된 CrN 코팅막의 전기화학적 물성 비교 연구

  • Jang, Hoon (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 장훈 (목포대학교 신소재공학과) ;
  • 전성용 (목포대학교 신소재공학과)
  • Received : 2021.04.01
  • Accepted : 2021.05.10
  • Published : 2022.04.30

Abstract

In this paper, we compared the properties of the chromium nitride (CrN) films prepared by inductively coupled plasma magnetron sputtering (ICPMS). As a comparison, CrN film prepared by a direct current magnetron sputtering (dcMS) is also studied. The crystal structure, surface and cross-sectional microstructure and composite properties of the as-deposited CrN films are compared by x-ray diffraction, field emission scanning electron microscopy, nanoindentation tester and corrosion resistance tester, respectively. It is found that the as-deposited CrN films by ICPMS grew preferentially on (200) plane when compared with that by dcMS on (111) plane. As a result, the films deposited by ICPMS have a very compact microstructure with high hardness: the nanoindentation hardness reached 19.8 GPa and 13.5 GPa by dcMS, respectively. Besides, the residual stress of CrN films prepared by ICPMS is also relatively large. After measuring the corrosion resistance, the corrosion current of films prepared by ICPMS was three order of magnitude smaller than that of CrN films deposited by dcMS.

Keywords

Acknowledgement

이 논문은 2021년도 정부(과학기술정보통신부)의 재원으로 한국연구재단-현장맞춤형 이공계 인재양성 지원사업의 지원을 받아 수행된 연구임 (No.NRF2019H1D8A1105567) 내부식 특성의 측정과 의미를 해석하는데 도움을 주신 목포해양대학교 기관시스템공학부 김성종 교수님께 감사를 표합니다.

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