반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

실리콘 상부 전극의 기계적 가공 연구

A Study of Mechanical Machining for Silicon Upper Electrode

  • 이은영 (한국기술교육대학교 메카트로닉스공학과) ;
  • 김문기 (한국기술교육대학교 메카트로닉스공학부)
  • Lee, Eun Young (Department of Mechatronics Engineering, Graduate School of Korea University of Technology and Education) ;
  • Kim, Moon Ki (School of Mechatronics Engineering, Korea University of Technology and Education)
  • 투고 : 2021.03.08
  • 심사 : 2021.03.15
  • 발행 : 2021.03.31
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초록

Upper electrode is one of core parts using plasma etching process at semiconductor. The purpose of this study is to analyze effects of cutting conditions for mechanical machining of silicon upper electrode. For this research, surface roughness of machined workpiece and depth of damage inside of silicon electrode are experimented and analyzed and different values of feed rate and depth of cut are applied for the experiments. From these experiments, it is verified that the surface roughness and internal damaged layer get worse according to take more fast feed rate. In conclusion, cutting condition is very important factor for machining. Results of this study can use to develop various parts which are made from single crystal silicon and affect various benefits to the semiconductor industry for better productivity.

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참고문헌

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