반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

10 nm 이하 초고해상도와 광폭 관측시야를 구현하기 위한 극초소형 마이크로컬럼용 정전형 디플렉터 연구

Study on an Electrostatic Deflector for Ultra-miniaturized Microcolumn to Realize sub-10 nm Ultra-High Resolution and Wide Field of View

  • 이형우 (선문대학교 대학원 나노과학과) ;
  • 이영복 (선문대학교 대학원 나노과학과) ;
  • 오태식 (선문대학교 공과대학 디스플레이반도체공학과)
  • Lee, Hyung Woo (Department of Physics and Nanoscience, Graduate School, Sunmoon University) ;
  • Lee, Young Bok (Department of Physics and Nanoscience, Graduate School, Sunmoon University) ;
  • Oh, Tae-Sik (Department of Display & Semiconductor Engineering, College of Engineering, Sunmoon University)
  • 투고 : 2021.10.07
  • 심사 : 2021.12.08
  • 발행 : 2021.12.31
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초록

A 7 nm technology node using extreme ultraviolet lithography with a wavelength of 13.5 nm has been recently developed and applied to the semiconductor manufacturing process. Furthermore, the development of sub-3 nm technology nodes continues to be required. In this study, design factors of an electrostatic deflector for an ultra-miniaturized microcolumn system that can realize an electron wavelength of below 1.23 nm with an acceleration voltage of above 1 eV were investigated using a three-dimensional simulator. Particularly, the optimal design of the electrostatic octupole floating deflector was derived by optimizing the design elements and improving the driving method of the 1 keV low energy ultra-miniaturized microcolumn deflector. As a result, the entire wide field of view greater than 330 ㎛ at a working distance of 4 mm was realized with an ultra-high-resolution electron beam spot smaller than 10 nm. The results of this study are expected to be a basis technology for realizing a wafer-scale multi-array microcolumn system, which is expected to innovatively improve the throughput per unit time, which is the biggest drawback of electron beam lithography.

키워드

참고문헌

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