DOI QR코드

DOI QR Code

Pulse current generator with improved waveform fidelity for high-voltage capacitively coupled plasma systems

  • Chae, Beomseok (Department of Electrical Engineering, Jeonbuk National University) ;
  • Min, Juhwa (Department of Electrical Engineering, Jeonbuk National University) ;
  • Suh, Yongsug (Department of Electrical Engineering, Jeonbuk National University) ;
  • Kim, Hyejin (Manufacturing Technology Center, Samsung Electronics) ;
  • Kim, Hyunbae (Manufacturing Technology Center, Samsung Electronics)
  • Received : 2020.03.25
  • Accepted : 2020.06.01
  • Published : 2020.09.20

Abstract

This paper proposes a current source-type pulse generator circuit to improve load voltage waveforms by solving the voltage ringing problem of capacitively coupled plasma systems. The voltage source-type pulse power supplies used in the plasma industry have short-circuit currents and voltage ringing problems with capacitively coupled plasma loads. The current source-type pulse generator proposed in this paper can solve these problems. The proposed circuit consists of four detailed circuits: bias current generator, bias current modulator, slope current generator, and slope current modulator. They form two constant currents at the DC link, and output two pulse currents to the load. These output currents contribute to generating the plasma load voltage required by the capacitively coupled plasma process. The proposed circuit is verified by a PLECS simulator and a laboratory-scale hardware system. To check the improvement of the output waveform, a voltage source-type pulse generator and the current source-type pulse generator are tested under the same experimental conditions. The results are represented by load voltage and current waveforms. In addition, the entire system of the current source-type pulse generator is designed and verified by simulation and experimental results. The resulting output waveforms meet the process requirements, and the obtained results demonstrate that the proposed current source-type pulse generator circuit can be suitably used for capacitively coupled plasma loads.

Keywords

Acknowledgement

This research was supported by Korea Electric Power Corporation. (Grant number:R18XA04)

References

  1. Koo, B.-W., Fang, Z., Godet, L., Radovanov, S.B., Cardinaud, C., Cartry, G.: Andr? Grouillet, and Damien Lenoble, "Plasma Diagnostics in Pulsed Plasma Doping (P2LAD) System". IEEE Trans. Plasma Sci. 32(2), 456-463 (2004) https://doi.org/10.1109/TPS.2004.828134
  2. Wang, D., Matsuda, M., Matsumoto, T., Namihira, T., Akiyama, H.: Energy transfer efciency of nano-seconds pulsed power generator for nonthermal plasma processing technique. IEEE Trans. Dielectr. Electr. Insul. 18(4), 1091-1096 (2011) https://doi.org/10.1109/TDEI.2011.5976100
  3. Grekhov, I.V.: Pulse power generation in nano- and subnanosecond range by means of ionizing fronts in semiconductors: the state of the art and future prospects. IEEE Trans. Plasma Sci. 38(5), 1118-1123 (2010) https://doi.org/10.1109/TPS.2010.2043857
  4. Shin, W., Choi, J., Kim, T.: Bidirectional pulse plasma power supply for treatment of air pollution. In: 2006 37th IEEE Power Electronics Specialists Conference, pp. 1-6 (2006).
  5. Bonnin, X., Brandelero, J., Videau, N., Piquet, H., Meynard, T.: A high voltage high frequency resonant inverter for supplying DBD devices with short discharge current pulses. IEEE Trans. Plasma Sci. 29(8), 4261-4269 (2014)
  6. Evans, M.D.G., Versailles, P., Sainct, F.P., Bergthorson, J., Coulombe, S.: Increased fame reactivity of a lean premixed fame through the use of a custom-built high-voltage pulsed plasma source. IEEE Trans. Plasma Sci. 42(10), 2844-2845 (2014) https://doi.org/10.1109/TPS.2014.2330552
  7. Diomede, P., Economou, D.J., Donnelly, V.M.: Instabilities in capacitively coupled plasmas driven by asymmetric trapezoidal voltage pulses. IEEE Trans. Plasma Sci. 42(10), 2822-2823 (2014) https://doi.org/10.1109/TPS.2014.2343639
  8. Akbar, D.: Investigation of single and dual RF capacitively coupled nitrogen plasma discharges using optical emission spectroscopy. IEEE Trans. Plasma Sci. 42(8), 2058-2064 (2014) https://doi.org/10.1109/tps.2014.2331337
  9. Heeren, T., Ueno, T., Wang, D., Namihira, T., Katsuki, S., Akiyama, H.: Fellow, "Novel Dual Marx Generator for Microplasma Applications". IEEE Trans. Plasma Sci. 33(4), 1205-1209 (2005) https://doi.org/10.1109/TPS.2005.852433
  10. Elgenedy, M.A., Darwish, A., Ahmed, S., Williams, B.W.: A modular multilevel generic pulse-waveform generator for pulsed electric feld applications. IEEE Trans. Plasma Sci. 45(9), 2527-2535 (2017) https://doi.org/10.1109/TPS.2017.2727068
  11. Abdelsalam, I., Elgenedy, M.A., Ahmed, S., Williams, B.W.: Fullbridge modular multilevel submodule-based high-voltage bipolar pulse generator with low-voltage dc, input for pulsed electric feld applications. IEEE Trans. Plasma Sci. 45(10), 2857-2864 (2017) https://doi.org/10.1109/TPS.2017.2743822
  12. Chae, B., Min, J., Suh, Y., Kim, H., Kim, H.: Pulse current generator with improved waveform fidelity for high voltage capacitively-coupled plasma system. In: 2018 IEEE Energy Conversion Congress and Exposition, pp. 7179-7185 (2018).

Cited by

  1. LLC inverter design for driving surface DBD optimized for airborne bacteria inactivation vol.21, pp.12, 2020, https://doi.org/10.1007/s43236-021-00321-w