Journal of Sensor Science and Technology (센서학회지)

The Korean Sensors Society (한국센서학회)
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Thermal Transfer Pixel Patterning by Using an Infrared Lamp Source for Organic LED Display

유기 발광 소자 디스플레이를 위한 적외선 램프 소스를 활용한 열 전사 픽셀 패터닝

  • Bae, Hyeong Woo (Realistic Media Research Center, Gumi Electronics and Information Technology Research Institute) ;
  • Jang, Youngchan (Realistic Media Research Center, Gumi Electronics and Information Technology Research Institute) ;
  • An, Myungchan (Realistic Media Research Center, Gumi Electronics and Information Technology Research Institute) ;
  • Park, Gyeongtae (Realistic Media Research Center, Gumi Electronics and Information Technology Research Institute) ;
  • Lee, Donggu (Realistic Media Research Center, Gumi Electronics and Information Technology Research Institute)
  • 배형우 (구미전자정보기술원 실감미디어 연구센터) ;
  • 장영찬 (구미전자정보기술원 실감미디어 연구센터) ;
  • 안명찬 (구미전자정보기술원 실감미디어 연구센터) ;
  • 박경태 (구미전자정보기술원 실감미디어 연구센터) ;
  • 이동구 (구미전자정보기술원 실감미디어 연구센터)
  • Received : 2019.11.21
  • Accepted : 2020.01.03
  • Published : 2020.01.31
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Abstract

This study proposes a pixel-patterning method for organic light-emitting diodes (OLEDs) based on thermal transfer. An infrared lamp was introduced as a heat source, and glass type donor element, which absorbs infrared and generates heat and then transfers the organic layer to the substrate, was designed to selectively sublimate the organic material. A 200 nm-thick layer of molybdenum (Mo) was used as the lightto-heat conversion (LTHC) layer, and a 300 nm-thick layer of patterned silicon dioxide (SiO2), featuring a low heat-transfer coefficient, was formed on top of the LTHC layer to selectively block heat transfer. To prevent the thermal oxidation and diffusion of the LTHC material, a 100 nm-thick layer of silicon nitride (SiNx) was coated on the material. The fabricated donor glass exhibited appropriate temperature-increment property until 249 ℃, which is enough to evaporate the organic materials. The alpha-step thickness profiler and X-ray reflection (XRR) analysis revealed that the thickness of the transferred film decreased with increase in film density. In the patterning test, we achieved a 100 ㎛-long line and dot pattern with a high transfer accuracy and a mean deviation of ± 4.49 ㎛. By using the thermal-transfer process, we also fabricated a red phosphorescent device to confirm that the emissive layer was transferred well without the separation of the host and the dopant owing to a difference in their evaporation temperatures. Consequently, its efficiency suffered a minor decline owing to the oxidation of the material caused by the poor vacuum pressure of the process chamber; however, it exhibited an identical color property.

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References

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