DOI QR코드

DOI QR Code

유연한 유기태양전지의 수분 투습 방지를 위해 원자층 증착법으로 제조된 Al2O3 박막에 대한 연구

Study on the Atomic Layer Deposition of Al2O3 Thin Film as Moisture Barrier Layer for High Efficiency Flexible Organic Solar Cell

  • 이봄 (숭실대학교 유기신소재파이버공학과) ;
  • 임주현 (숭실대학교 유기신소재파이버공학과) ;
  • 권도윤 (숭실대학교 유기신소재파이버공학과) ;
  • 오영택 (숭실대학교 스마트웨어러블공학과) ;
  • 김시몬 (숭실대학교 유기신소재파이버공학과) ;
  • 신진용 (숭실대학교 유기신소재파이버공학과) ;
  • 임회연 (숭실대학교 유기신소재파이버공학과) ;
  • 이수언 (숭실대학교 스마트웨어러블공학과) ;
  • 김승희 (숭실대학교 유기신소재파이버공학과) ;
  • 김봉훈 (숭실대학교 유기신소재파이버공학과)
  • Lee, Bom (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Lim, Joo Hyun (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Kwon, Do Yun (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Oh, Young Taek (Department of Smart Wearables Engineering, Soongsil University) ;
  • Kim, Simon (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Shin, Jin Yong (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Lim, Heo Yeon (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Lee, Su Eon (Department of Smart Wearables Engineering, Soongsil University) ;
  • Kim, Seung Hee (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Kim, Bong Hoon (Department of Organic Materials and Fiber Engineering, Soongsil University)
  • 투고 : 2020.11.30
  • 심사 : 2020.12.23
  • 발행 : 2020.12.31

초록

A moisture barrier layer with high density and uniformity is essential for increasing the lifespan of optoelectronic devices such as flexible organic solar cells, LEDs, and photodetectors. In this study, various surface pre-treatments (O2 plasma, UVO treatment, Al seed layer, and thermal annealing process) were performed on a polyethylene naphthalate (PEN) film to form a functional group of chemical adsorption with the atomic layer deposition (ALD) precursor. We investigated the effect of the surface pre-treatment of a PEN substrate for a deposition of Al2O3 thin film in terms of the deposition uniformity and water vapor transmittance rate (WVTR). For example, the root mean square roughness of the bare PEN film/Al2O3 was RRMS=3.26 nm, whereas the O2 plasma treated PEN film/Al2O3 had RRMS=0.99 nm because of the presence of a functional group. As a result, WVTR of bare PEN film/Al2O3 was 0.83 g/㎡/day, whereas that of O2 plasma treated PEN film/Al2O3 decreased to 0.38 g/㎡/day.

키워드

과제정보

본 연구는 2020년도 정부(과학기술정보통신부)의 재원으로 한국연구재단의 지원을 받아 수행된 연구임(No.2020R1C1C1014980).

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