Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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The Properties of Multi-Layered Optical Thin Films Fabricated by Pulsed DC Magnetron Sputtering

Pulsed DC 마그네트론 스퍼터링으로 제조된 다층 광학박막의 특성

  • Kim, Dong-Won (Department of Advanced Materials Engineering, Kyonggi University)
  • 김동원 (경기대학교 신소재공학과)
  • Received : 2019.08.16
  • Accepted : 2019.08.29
  • Published : 2019.08.30
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Abstract

Optical thin films were deposited by using a reactive pulsed DC magnetron sputtering method with a high density plasma(HDP). In this study, the effect of sputtering process conditions on the microstructure and optical properties of $SiO_2$, $TiO_2$, $Nb_2O_5$ thin films was clarified. These thin films had flat and dense microstructure, stable stoichiometric composition at the optimal conditions of low working pressure, high pulsed DC power and RF power(HDP). Also, the refractive index of the $SiO_2$ thin films was almost constant, but the refractive indices of $TiO_2$ and $Nb_2O_5$ thin films were changed depending on the microstructure of these films. Antireflection films of $Air/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/SiO_2/Nb_2O_5/Glass$ structure designed by Macleod program were manufactured by our developed sputtering system. Transmittance and reflectance of the manufactured multilayer films showed outstanding value with the level of 95% and 0.3%, respectively, and also had excellent durability.

Keywords

References

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