반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

Direct Writing Lithography Technique for Semiconductor Fabrication Process Using Proton Beam

  • Kim, Kwan Do (Dept. of Convergence Software, College of IT Engineering, Pyeongtaek University)
  • 투고 : 2019.02.21
  • 심사 : 2019.03.17
  • 발행 : 2019.03.31
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초록

Proton beam writing is a direct writing lithography technique for semiconductor fabrication process. The advantage of this technique is that the proton beam does not scatter as they travel through the matter and therefore maintain a straight path as they penetrate into the resist. The experiment has been carried out at Accelerator Mass Spectrometry facility. The focused proton beam with the fluence of $100nC/mm^2$ was exposed on the PMMA coated silicon sample to make a pattern on a photo resist. The results show the potential of proton beam writing as an effective way to produce semiconductor fabrication process.

키워드

참고문헌

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