Design & Manufacturing

Korean Society of Die & Mold Engineering (한국금형공학회)
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A experimental study about plasma ion treatment to improve hardness of electro-polished surface

전해연마면의 표면경도 향상을 위한 플라즈마 이온질화 처리법에 관한 실험적 연구

  • Kim, Jin-Beom (Department of Mechanical Engineering, Incheon National University) ;
  • Hong, Pil-Gi (Department of Mechanical Engineering, Incheon National University) ;
  • Seo, Tae-Il (Department of Mechanical Engineering, Incheon National University) ;
  • Son, Chang-Woo (Department of Mechanical Engineering, Incheon National University)
  • Received : 2018.12.17
  • Accepted : 2019.03.31
  • Published : 2019.03.31
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Abstract

The size and prospects of the domestic semiconductor equipment market are increasing every year. In the case of various parts used inside semiconductor equipments, high durability such as high strength and abrasion resistance is demanded. Particularly, the gases used in semiconductor production processes are toxic. In order to prevent such toxic gas leakage, a precision processing technique and a surface treatment technique for preventing corrosion are required. Electro-polishing is an electro-chemical method of polishing a metal surface to make it smooth and polished. Electro-polishing is mainly used in the finishing process of metal surface. Unlike mechanical polishing, electro-polishing is used in many fields, such as fine chemical etching equipment, since no damaged layer or burr, fine polishing groove and particles are generated. However, in order to withstand the gas used in the semiconductor equipment, the parts must have high corrosion resistance. However, the surface hardness generally become lowered through electro-polishing. Therefore, in this study, surface hardness were experimentally observed before and after electro-polishing. Then, a method of improving hardness by preparing a nitrided layer by plasma ion nitriding treatment.

Keywords

Acknowledgement

Supported by : 산업기술평가관리원(KEIT)

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