Magnetonic Resistance Properties of Semiconductor Thin Films by Plasmon Effect on Fabricated Si(100) Substrate

플라즈몬 효과에 의한 실리콘 기판위에 증착된 반도체 박막의 자기저항특성

  • Oh, Teresa (Department of Semiconductor Engineering, Cheongju University)
  • Received : 2019.09.13
  • Accepted : 2019.09.26
  • Published : 2019.09.30

Abstract

Plasmons have conductive properties using the effect of amplifying magnetic and electric fields around metal particles. The collective movement of free electrons in metal particles induces and produces the generation of plasmon. Because the plasmon is concentrated on the surface of the nanoparticles, it is also called the surface plasmon. The polarizing effect of plasma on the surface is similar to the principle of surface currents occurring in insulators. In this study, it was found the conditions under which plasma is produced in SiOC insulators and studied the electrical properties of SiOC insulators that are improved in conductivity by plasmons. Due to the heat treatment temperature of thin film, plasma formation was shown differently, metal particles were used with normal aluminium, SiOC thin films were treated with heat at 60 degrees, conductivity was improved dramatically, and heat treatment at higher temperatures was found to be less conductivity.

Keywords

References

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