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Study of Driving and Thermal Stability of Anode-type Ion Beam Source by Charge Repulsion Mechanism

  • Huh, Yunsung (R&D Center, Finesolution Co., Ltd.) ;
  • Hwang, Yunseok (R&D Center, Finesolution Co., Ltd.) ;
  • Kim, Jeha (Department of Energy Convergence Engineering, Cheongju University)
  • Received : 2018.04.27
  • Accepted : 2018.05.31
  • Published : 2018.05.30

Abstract

We fabricated an anode-type ion beam source and studied its driving characteristics of the initial extraction of ions using two driving mechanisms: a diffusion phenomenon and a charge repulsion phenomenon. For specimen exposed to the ion beam in two methods, the surface impurity element was investigated by using X-ray photoelectron spectroscopy. Upon Ar gas injection for plasma generation the ion beam source was operated for 48 hours. We found a Fe 2p peak 5.4 at. % in the initial ions by the diffusion mechanism while no indication of Fe in the ions released in the charge repulsion mechanism. As for a long operation of 200 min, the temperature of ion beam sources was measured to increase at the rate of ${\sim}0.1^{\circ}C/min$ and kept at the initial value of $27^{\circ}C$ for driving by diffusion and charge repulsion mechanism, respectively. In this study, we confirmed that the ion beam source driven by the charge repulsion mechanism was very efficient for a long operation as proved by little electrode damage and thermal stability.

Keywords

References

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