반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
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간섭기반 스냅샷 분광편광위상측정의 열 안정성 분석

Thermal stability analysis of interferometric snapshot spectro-polarimeter

  • Choi, Inho (Mechanical system Engineering, Chonbuk national university) ;
  • Dembele, Vamara (Mechanical system Engineering, Chonbuk national university) ;
  • Paul, Madhan Jayakumar (Mechanical system Engineering, Chonbuk national university) ;
  • Choi, Sukhyun (Mechanical system Engineering, Chonbuk national university) ;
  • Kim, Junho (Mechanical system Engineering, Chonbuk national university) ;
  • Baek, Byung-Joon (Mechanical system Engineering, Chonbuk national university) ;
  • Kim, Daesuk (Mechanical system Engineering, Chonbuk national university)
  • 투고 : 2018.09.03
  • 심사 : 2018.09.19
  • 발행 : 2018.09.30
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초록

In typical spectroscopic ellipsometry, the optical and geometrical properties of thin film and nano pattern can be obtained by measuring the polarization state of light reflected/transmitted from the object by rotating a analyzer or a compensator. We proposed a snapshot spectroscopic ellipsometric system based on a modified Michelson interferometer to overcome the time-consuring measurement principle due to rotating part. The proposed system provides spectral ellipsometric parameters (psi, delta) in real time by using a single spectral interference signal generated in the interferometric polarization module. However, it has a long-term stability problem resulting in delta(k) drift. In this paper, it is experimentally proved that the drift problem is caused by anisotropic refractive index change of the beam intersection layer in beam splitter of interferometer.

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참고문헌

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