A Study on the Trimethylsilanol Analysis Method of Semiconductor Processing using a Proton Transfer Reaction - Time of Flight Mass Spectrometer

반도체 제조공정에서 양자전이 비행시간 질량분석기를 이용한 Trimethylsilanol 분석 방법에 대한 연구

  • Kim, Jeong-Ho (Department of Environmental Engineering, University of Seoul) ;
  • Park, Jin-Soo (Climate&Air Quality Research Department, National Institute of Environmental Research) ;
  • Min, Cheol-Hyun (Division of MS, APM Engineering Co., Ltd.) ;
  • Kim, So-Young (National Institute of Chemical Safety) ;
  • Yoon, Gwan-Hoon (Division of MS, APM Engineering Co., Ltd.) ;
  • Kim, Shin-Do (Department of Environmental Engineering, University of Seoul)
  • 김정호 (서울시립대학교 환경공학과) ;
  • 박진수 (국립환경과학원 기후대기연구부) ;
  • 민철현 (에이피엠엔지니어링 MS부) ;
  • 김소영 (국립화학물질안전원) ;
  • 윤관훈 (에이피엠엔지니어링 MS부) ;
  • 김신도 (서울시립대학교 환경공학과)
  • Received : 2017.02.03
  • Accepted : 2017.03.17
  • Published : 2017.03.30

Abstract

Silica compounds such as Trimethylsilanol (TMS) used in the photolithography area of semiconductor manufacture processing have irreversible dramatic impact on optical lenses used on photolithography tools. Here, a Proton Transfer Reaction-Time of Flight Mass Spectrometer (PTR-ToFMS) was applied for real-time and continuous monitoring of TMS contamination induced by the fabrication process. TMS measurements by various electronic field (E/N) were carried out using the PTR-ToFMS in order to fix the analysis condition. The TMS mass mass spectrum was determined by varying the E/N value of the PTR-ToFMS ion drift tube. The ratio of the measured ion ($C_3H_{11}OSi^+$) was influenced according to the E/N value and optimal analysis condition of TMS was around 100 Td.

반도체 포토리소그래피 공정에서 사용되는 Trimethylsilanol(TMS)과 같은 실리카 화합물은 포토리소그래피에 사용되는 광학 렌즈에 심각한 영향을 미친다. 본 연구에서는 TMS 실시간으로 모니터링하기 위해 양자전이 비행시간 질량분석기(PTR-ToFMS)를 적용하였으며, 분석 조건을 설정하기 위하여 PTR-ToFMS의 다양한 전장강도(E/N) 값에서 TMS를 측정하였다. 그 결과 TMS 질량스펙트럼은 PTR-ToFMS 이온이동도관의 E/N 값을 변화시킴으로써 결정되었다. 측정된 이온($C_3H_{11}OSi^+$)의 비율은 E/N 값에 영향을 받았고, TMS의 최적 분석 조건은 약 100 Td 이었다.

Keywords