Ceramist (세라미스트)

The Korean Ceramic Society (한국세라믹학회)
권호 표지

2차원 소재 응용을 위한 원자층 증착 기술

  • Published : 2017.09.30
Download PDF
⟨ Previous Next ⟩

Abstract

Keywords

References

  1. Novoselov K. S, Mishchenko A, Carvalho A, Neto, A. H. C, "2D Materials and van Der Waals Heterostructures", Science, 353, aac9439 (2016) https://doi.org/10.1126/science.aac9439
  2. A. K. Geim and I. V. Grigorieva, "Van der Waals Heterostructures", Nature, 499, 419-425 (2013) https://doi.org/10.1038/nature12385
  3. Y. Liu, N. O. Weiss, X. Duan, H. C. Cheng, Y. Huang and X. Duan, "Van der Waals heterostructures and devices", Nature Reviews Material, 1, 16042 (2016) https://doi.org/10.1038/natrevmats.2016.42
  4. H. Yang, J. Heo, S. Park, H. J. Song, D. H. Seo, K. Byun, P. Kim, I. K. Yoo, H. Chung, and K. Kim, "Graphene Barristor, a Triode Device with a Gate-Controlled Schottky Barrier", Science, 336, 61-64 (2012) https://doi.org/10.1126/science.1217654
  5. H. G. Kim and H-B-R. Lee, "Atomic Layer Deposition on 2D Materials", Chem. Mater, 29[9], 3809-3826 (2017) https://doi.org/10.1021/acs.chemmater.6b05103
  6. L. Liao and X. Duan, "Graphene-Dielectric Integration for Graphene Transistors", Mater. Sci. Eng.: R: Reports, 70, 354-370 (2010) https://doi.org/10.1016/j.mser.2010.07.003
  7. H. Van Bui, F. Grillo and J. R. van Ommen",A tomic and molecular layer deposition: off the beaten track", Chem. Commun., 53, 45-71 (2017) https://doi.org/10.1039/C6CC05568K
  8. S. M. George, "Atomic Layer Deposition: An Overview", Chem. Rev., 110[1], 111-131 (2010) https://doi.org/10.1021/cr900056b
  9. N. Pinna and M. Knez, "Atomic Layer Deposition of Nanostructured Materials", Wiley-VCH Verlag & Co. KGaA, 12, 69469 (2012)
  10. Markku Ylilammi, "Monolayer Thickness in Atomic Layer Deposition", Thin Solid Films, 279, 124-130 (1996) https://doi.org/10.1016/0040-6090(95)08159-3
  11. M. A. Alam and M. L. Green, "Mathematical description of atomic layer deposition and its application to the nucleation and growth of $HfO_2$ gate dielectric layers", J. Appl. Phys, 94[5], 3403 (2003) https://doi.org/10.1063/1.1599978
  12. Y. Xuan, Y. Q. Wu, T. Shen, M. Qi, M. A. Capano, J. A. Cooper and P. D. Ye, "Atomic-layer-deposited nanostructures for graphene-based nanoelectronics", Applied Physics Letters., 92, 013101 (2008) https://doi.org/10.1063/1.2828338
  13. B. K. Lee, S. Y. Park, H. C. Kim, K. J. Cho, E. M. Vogel, M. J. Kim, R. M. Wallace and J. Y. Kim, "Conformal $Al_2O_3$ Dielectric Layer Deposited by Atomic Layer Deposition for Graphene-Based Nanoelectronics", Appl. Phys. Lett., 92, 203102 (2008) https://doi.org/10.1063/1.2928228
  14. Kun Xu and Peide D. Ye, "Theoretical Study of Atomic Layer Deposition Reaction Mechanism and Kinetics for Aluminum Oxide Formation at Graphene Nanoribbon Open Edges", J. Phys. Chem. C, 114, 10505-10511 (2010) https://doi.org/10.1021/jp101387g
  15. H-B-R. Lee, S. H. Baeck, T. F. Jaramillo and S. F. Bent, "Growth of Pt Nanowires by Atomic Layer Deposition on Highly Ordered Pyrolytic Graphite", Nano Lett., 13, 457-463 (2013) https://doi.org/10.1021/nl303803p
  16. H. S. Lee, H-B-R. Lee, S. K. Kwon, M. Salmeron and J. Y. Park, "Internal and External Atomic Steps in Graphite Exhibit Dramatically Different Physical and Chemical Properties", ACS Nano, 9[4], 3814-3819 (2015) https://doi.org/10.1021/nn506755p
  17. M. P. Zach, K. H. Ng and R. M. Penner, "Molybdenum Nanowires by Electrodeposition", Science, 290, 2120-2123 (2000) https://doi.org/10.1126/science.290.5499.2120
  18. S. W. Ryu, J. H. Yoon, H. S. Moon, B. G. Shong, H. G. Kim and H-B-R. Lee, "Atomic layer deposition of 1D and 2D nickel nanostructures on graphite", Nanotechnology, 28[11], in press (2017)
  19. K. Y. Kim, H-B-R. Lee, R. W. Johnson, J. T. Tanskanen, N. Liu, M. G. Kim, C. G. Pang, C. Ahn, S. F. Bent and Z. Bao, "Selective metal deposition at graphene line defects by atomic layer deposition", Nature Comm., 5, 4781 (2014) https://doi.org/10.1038/ncomms5781
  20. D. L. Duong, G. H. Han, S. M. Lee, F. Gunes, E. S. Kim, S. T. Kim, H. T. Kim, Q. H. Ta, K. P. So, S. J. Yoon, S. J. Chae, Y. W. Jo, M. H. Park, S. H. Chae, S. C. Lim, J. Y. Choi and Y. H. Lee, "Probing graphene grain boundaries with optical microscopy", Nature, 490, 235-239 (2012) https://doi.org/10.1038/nature11562
  21. H-B-R. Lee and S. F. bent, "Formation of Continuous Pt Films on the Graphite Surface by Atomic Layer Deposition with Reactive $O_3$", Chem. Mater, 27[19], 6802-6809 (2015) https://doi.org/10.1021/acs.chemmater.5b03076
  22. S. Jandhyala, G. Mordi, B. K. Lee, C. Floresca, P. R. Cha, J. H Ahn, R. M. Wallace, Y. J. Chabal, M. J. Kim, L. Colombo, K. J. Cho and J. Y. Kim, "Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone", ACS Nano, 6[3], 2722-2730 (2012). https://doi.org/10.1021/nn300167t
  23. D. Sharma, M. Amani, A. Motayed, P. B. Shah, A. G. Birdwell, S. Najmaei, P. M. Ajayan, J. Lou, M. Dubey, Q. Li and A. V. Danvydov, "Electrical transport and low-frequency noise in chemical vapor deposited single-layer $MoS_2$ devices", Nanotechnology, 25, 155702 (2014) https://doi.org/10.1088/0957-4484/25/15/155702
  24. L. K. Oh, J. Tanskanen, H. Jung, K. S. Kim, M. J. Lee, Z. H. Lee, S. K. Lee, J. H. Ahn, C. W. Lee, K. Y. Kim, H. J. Kim and H-B-R. Lee, "Nucleation and Growth of the $HfO_2$ Dielectric Layer for Graphene-Based Devices", Chem. Mater, 27[17], 5868-5877 (2015) https://doi.org/10.1021/acs.chemmater.5b01226
  25. H. Alles, J. Aarik, A. Aidla, A. Fay, J. Kozlova, A. Niilisk, M. Pars, M. Rahn, M. Wiesner, P. Hakonen, V. Sammelselg, "Atomic Layer Deposition of HfO2 on Graphene from $HfCl_4$ and $H_2O$", Cent. Eur. J. Phys., 9[2], 319-324 (2011) https://doi.org/10.2478/s11534-010-0040-x
  26. G. Liu, W. Stillman, S. Rumyantsev, Q. Shao, M. Shur, and A. A. Balandin, "Low-Frequency Electronic Noise in the Double-Gate Single-Layer Graphene Transistors", Appl. Phys. Lett. 95, 033103 (2009) https://doi.org/10.1063/1.3180707
  27. S. J. Jeong, H. W. Kim, J. S. Heo, M. H. Lee, H. J. Song, J. Y. Ku, Y. S. Lee, Y. C. Cho, W. J. Jeon, H. S. Suh, S. W. Hwang and S. J. Park, "Physisorbed-precursor-assisted atomic layer deposition of reliable ultrathin dielectric films on inert graphene surfaces for low-power electronics", 2D Mater., 3, 035027 (2016) https://doi.org/10.1088/2053-1583/3/3/035027
  28. Y. S. Lee, W. J. Jeon, Y. C. Cho, M. H. Lee, S. J. Jeong, J. S. Park and S. J. Park, "Mesostructured $HfxAlyO_2$ Thin Films as Reliable and Robust Gate Dielectrics with Tunable Dielectric Constants for High-Performance Graphene-Based Transistors", ACS Nano, 10[7], 6659-6666 (2016) https://doi.org/10.1021/acsnano.6b01734
  29. B. Fallahazad, K. Lee, G. Lian, S. Kim, C. M. Corbet, D. A. Ferrer, L. Colombo and E. Tutuc, "Scaling of $Al_2O_3$ dielectric for graphene field-effect transistors", Appl. Phys. Lett. 100, 093112 (2012); https://doi.org/10.1063/1.3689785
  30. H. Liu, M. Si, S. Najmaei, A. T. Neal, Y. Du, P. M. Ajayan, J. Lou and P. D. Ye, "Statistical Study of Deep Sub-Micron Dual-Gated Field-Effect Transistors on Monolayer CVD Molybdenum Disulfide Films", Nano Lett, 13[6], 2640-2646 (2013) https://doi.org/10.1021/nl400778q
  31. H. Yuan, G. J Cheng, S. Yu, A. R. Hight walker, C. A. Richter, M. H. Pan and Q. Li, "Field Effects of Current Crowding in Metal-$MoS_2$ Contacts", Appl. Phys. Lett. 108, 103505 (2016) https://doi.org/10.1063/1.4942409
  32. F. Gong, W. Luo, J. Wang, P. Wang, H. Fang, D. Zheng, N. Guo, Jingli wang, M. Luo, J. C. Ho, X. Chen, W. Lu, L. Liao and W. Hu, "High-Sensitivity Floating-Gate Phototransistors Based on $WS_2$ and $MoS_2$", Adv. Funct. Mater, 26, 6084-6090 (2016) https://doi.org/10.1002/adfm.201601346
  33. W. Liu, J. Kang, D. Sarkar, Y. Khatami, D. jena and K. Banerjee, "Role of Metal Contacts in Designing High-Performance Monolayer N-Type $WSe_2$ Field Effect Transistors", Nano Lett., 13[5], 1983-1990 (2013) https://doi.org/10.1021/nl304777e
  34. X. Luo, Y. Rahborihagh, J. C. M. Hwang, H. Liu, Y. Du and P. D. Ye, "Temporal and Thermal Stability of $Al_2O_3$-Passivated Phosphorene MOSFETs", IEEE Electron Device Letters, 35[12], 1314-1316 (2014) https://doi.org/10.1109/LED.2014.2362841
  35. X. Wang, S. M. Tabakman and H. Dai, "Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene", J. Am. Chem. Soc, 130[26], 8152-8153 (2008) https://doi.org/10.1021/ja8023059
  36. J. M. P. Alaboson, Q. H. Wang, J. D. Emery, A. L. Lipson, M. J. Bedzyk, J. W. Elam, M. J. Pellin and M. C. Hersan, "Seeding Atomic Layer Deposition of High-K Dielectrics on Epitaxial Graphene with Organic Self-Assembled Monolayers", ACS Nano, 5[6], 5223-5232 (2011) https://doi.org/10.1021/nn201414d
  37. J. E. Johns, H. J. Karmel, J. M. P. Alaboson and M. C. Hersa, "Probing the Structure and Chemistry of Perylenetetracarboxylic Dianhydride on Graphene before and after Atomic Layer Deposition of Alumina", J. Phys. Chem. Lett, 3, 1974-1979 (2012) https://doi.org/10.1021/jz300802k
  38. A. Tselev, V. K. Sangwan, D. Jariwala, T. J. marks, L. J. Lauhon, M. C. Hersam and S. V. Kalinin, "Near-Field Microwave Microscopy of High-K Oxides Grown on Graphene with an Organic Seeding Layer", Appl. Phys. Lett., 103, 243105 (2013) https://doi.org/10.1063/1.4847675
  39. V. K. Sangwan, D. Jariwala, S. A. Filippone, H. J. karmel, J. E. Johns, J. M. P. Alaboson, T. J. marks, L. J. Lauhon and M. C. Hersam, "Quantitatively Enhanced Reliability and Uniformity of High-K Dielectrics on Graphene Enabled by Self-Assembled Seeding Layers", Nano Lett., 13[3], 1162-1167 (2013) https://doi.org/10.1021/nl3045553
  40. C. Wirtz, T. Hallam, C. P. Cullen, N. C. Berner, M. O. brien, M. Marcia, A. Hirsch and G. S. Duesberg, "Atomic Layer Deposition on 2D Transition Metal Chalcogenides: Layer Dependent Reactivity and Seeding with Organic Ad-Layers", Chem. Comm., 51, 16553-16556 (2015) https://doi.org/10.1039/C5CC05726D
  41. J. Yang, S. K. Kim, W. Choi, S.H. Park, Y. K. Jung, M. H. Cho and H. S. Kim, "Improved Growth Behavior of Atomic-Layer-Deposited High-k Dielectrics on Multilayer $MoS_2$ by Oxygen Plasma Pretreatment", ACS Appl. Mater. Interfaces., 5[11], 4739-4744 (2013) https://doi.org/10.1021/am303261c
  42. A. Azcatl, S. McDonnell, Santosh K. C, X. Peng, H. Dong, X. Qin, R. Addou, G. I. Mordi, N. Lu, J. Y. Kim, M. J. Kim, K. J. Cho, R. M. Wallace, "Functionalization for Ultra-Thin Atomic Layer Deposited Dielectrics", Appl. Phys. Lett. 104, 111601 (2014) https://doi.org/10.1063/1.4869149
  43. S. Y. Park, S. Y. Kim, Y. R. Choi, M. J. Shin, J. Y. Kim and W. Choi, "Interface Properties of Atomic-Layer-Deposited $Al_2O_3$ Thin Films on Ultraviolet/Ozone-Treated Multilayer $MoS_2$ Crystals", ACS Appl. Mater. Interfaces, 8[18], 11189-11193 (2016) https://doi.org/10.1021/acsami.6b01568
  44. S. Y. Kim, S. Y. Park and W. Choi, "Enhanced Carrier Mobility of Multilayer $MoS_2$ Thin-Film Transistors by $Al_2O_3$ Encapsulation", Appl. Phys. Lett. 109, 152101 (2016) https://doi.org/10.1063/1.4964606
  45. A. Azcatl, Santosh KC, X. peng, N. Lu, S. McDonnell, X. Qin, F. D. Dios, R. Addou, J . Y. Kim, M. J. Kim, K. J. Cho and R. M. Wallace, "$HfO_2$ on UV-$O_3$ Exposed Transition Metal Dichalcogenides: Interfacial Reactions Study", 2D Mater., 2, 014004 (2015) https://doi.org/10.1088/2053-1583/2/1/014004
  46. C. D. Young, P. Zhao, P. B. Barrett, A. Azcatl, P. K . Hurley, Y. Y. Gomeniuk, M. Schmidt, C. L. Hinkle and R. M. Wallace, "Evaluation of Few-Layer $MoS_2$ Transistors with a Top Gate and $HfO_2$ Dielectric", ECS Trans, 75[5], 153-162 (2016) https://doi.org/10.1149/07505.0153ecst
  47. D. B. Farmer and R. G. Gordon, "Atomic Layer Deposition on Suspended Single-Walled Carbon Nanotubes via Gas-Phase Non-covalent Functionalization", Nano Lett., 6[4], 699-703 (2006) https://doi.org/10.1021/nl052453d
  48. T. W. Nam, Y. J. Park, H. S. Lee, I. K. Oh, J. H. Ahn, S. M. Cho, H. G. Kim and H-B-R. Lee, "A composite layer of atomic-layer-deposited $Al_2O_3$ and graphene for flexible moisture barrier", Carbon , 116, 553-561 (2017) https://doi.org/10.1016/j.carbon.2017.02.023
  49. G. Sundaram, D. Monsma and J. Becker, "Leading Edge Atomic Layer Deposition Applications", ECS Transactions, 16[4], 19-27 (2008)
  50. L. Wang, J. J. Travis, A. S. Cavanagh, X. Liu, S. P. Koenig, P. Y. Huang, S. M. George and J. S. Bunch, "Ultrathin Oxide Films by Atomic Layer Deposition on Graphene", Nano Lett., 12[7], 3706-3710 (2012) https://doi.org/10.1021/nl3014956