The Transactions of The Korean Institute of Electrical Engineers (전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
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Deposition and Optimization of Al-doped ZnO Thin Films Fabricated by In-line Sputtering System

인라인 스퍼터를 이용한 알루미늄 도핑된 산화아연 박막의 증착 및 특성 최적화 연구

  • Kang, Dong-Won (Dept. of Solar & Energy Engineering, Cheongju University)
  • Received : 2017.06.11
  • Accepted : 2017.07.18
  • Published : 2017.08.01
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Abstract

We deposited Al-doped ZnO (ZnO:Al) thin films on glass substrates ($200mm{\times}200mm$) by using in-line magnetron sputtering system. Effects of various deposition parameters such as working pressure, deposition power and substrate temperature on optoelectronic characteristics including surface-texture etching profiles were carefully investigated in this study. We found that relatively low working pressure and high deposition power offered to obtain enhanced conductivity and optical transmittance. Haze properties showed similar trend with the transmittance. Furthermore, surface-texture etching study exhibited good morphologies when the films were deposited at $200-300^{\circ}C$. On the basis of these optimizations, we could find the deposition region that produces highly transparent and conductive properties including efficient light scattering capability.

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References

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