Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
권호 표지
DOI QR코드

DOI QR Code

Effect of Post-deposition Rapid Thermal Annealing on the Electrical and Optical Properties of ZTO/Ag/ZTO Tri-layer Thin Films

급속열처리에 따른 ZTO/Ag/ZTO 박막의 전기적, 광학적 특성 개선 효과

  • Song, Young-Hwan (School of Materials Science and Engineering, University of Ulsan) ;
  • Eom, Tae-Young (School of Materials Science and Engineering, University of Ulsan) ;
  • Heo, Sung-Bo (Functional Components & Materials Group, KITECH) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 송영환 (울산대학교 첨단소재공학부) ;
  • 엄태영 (울산대학교 첨단소재공학부) ;
  • 허성보 (한국생산기술연구원 동남지역본부 기능성부품소재그룹) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2017.05.08
  • Accepted : 2017.05.22
  • Published : 2017.07.30
Download PDF
⟨ Previous Next ⟩

Abstract

The ZTO single layer and ZTO/Ag/ZTO tri-layer films were deposited on glass substrates by using the radio frequency (RF) and direct current (DC) magnetron sputtering and then rapid thermal annealed (RTA) in a low pressure condition for 10 minutes at 150 and $300^{\circ}C$, respectively. As deposited tri-layer films show the 81.7% of visible transmittance and $4.88{\times}10^{-5}{\Omega}cm$ of electrical resistivity, while the films annealed at $300^{\circ}C$ show the increased visible transmittance of 82.8%. The electrical resistivity also decreased as low as $3.64{\times}10^{-5}{\Omega}cm$. From the observed results, it is concluded that rapid thermal annealing (RTA) is an attractive post-deposition process to optimize the opto-elecrtical properties of ZTO/Ag/ZTO tri-layer films for the various display applications.

Keywords

References

  1. D. Kim : Vacuum 81 (2006) 279-284. https://doi.org/10.1016/j.vacuum.2006.04.003
  2. Y. H. Song, H. J. Moon and D. Kim : J. Korean. Soc. Heat Treat., 29 (2016) 163. https://doi.org/10.12656/jksht.2016.29.4.163
  3. V. K. Jain, P. Kumar, M. Kumar, P. Jain and Y. K. Vijay : J. Alloys Compd., 509 (2011) 3541. https://doi.org/10.1016/j.jallcom.2010.10.212
  4. H. J. Moon and D. Kim : Korean J. Met. Mater. 55 (2017) 209.
  5. G. Haacke : J. Appl. Phys., 47 (1976) 4086. https://doi.org/10.1063/1.323240
  6. B. D. Cullity : Elements of X-ray Diffractions, Addition-Wesley, Reading, MA, 1978.
  7. J. H. Park, J. H. Chae and D. Kim : J. Alloys Compd., 478 (2009) 330. https://doi.org/10.1016/j.jallcom.2008.11.065
  8. 허성보 : 전자빔 조사 에너지에 따른 $GZO/TiO_2$ 박막의 물성변화, 울산대 석사학위논문 (2013) 40.