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A Study on Structure and Magnetic Properties of Fe-N Thin Films with Different DC Magnetron Sputtering Power and Time

증착 Power의 세기와 시간에 따른 Fe-N 박막의 구조와 자성 특성

  • 한동원 (인제대학교 에너지융합학과) ;
  • 박원욱 (인제대학교 에너지융합학과) ;
  • 김종우 (재료연구소) ;
  • 권아람 (한국생산기술연구원 동남지역본부)
  • Received : 2017.04.24
  • Accepted : 2017.04.28
  • Published : 2017.04.30

Abstract

Due to the high saturation magnetization (~2.4 T), $Fe_{16}N_2$ is interesting for the thin film application such as an actuator, data record storage and sensor etc. In this study, Fe-N thin films were deposited on Si(001) substrate with various power and deposition time by DC magnetron sputtering, in order to get high portion of $Fe_{16}N_2$ phase. Surface morphology, phase formation and magnetic properties were measured. As a result, Saturation magnetization and Remanence magnetization reach to ~2.45 T and 1.41T. But, Coercivity was not enough in this experiments. Its value lower than 100 Oe. Which is very close to theoretical value.

Keywords

References

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