Journal of the Microelectronics and Packaging Society (마이크로전자및패키징학회지)

The Korean Microelectronics and Packaging Society (한국마이크로전자및패키징학회)
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Preparation of 40 wt.% Ag-coated Cu Particles with Thick Ag Shells and Suppression of Defects in the Particles

두꺼운 Ag shell이 형성되는 40 wt.% Ag 코팅 Cu 입자의 제조 및 입자 내 결함 억제

  • Choi, Eun Byeol (Program of Materials Science & Engineering, Convergence Institute of Biomedical Engineering and Biomaterials, Seoul National University of Science & Technology) ;
  • Lee, Jong-Hyun (Department of Materials Science & Engineering Seoul National University of Science & Technology)
  • 최은별 (서울과학기술대학교 의공학-바이오소재 융합협동과정 신소재공학 프로그램) ;
  • 이종현 (서울과학기술대학교 신소재공학과)
  • Received : 2017.12.18
  • Accepted : 2017.12.26
  • Published : 2017.12.31
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Abstract

To prepare the Cu-based filler material indicating enhanced oxidation resistance property and Ag content, Ag-coated Cu particles was fabricated by Ag plating of 40 wt % on the spherical Cu particles with an average size of $2{\mu}m$ and their oxidation behavior was also evaluated. In the case that ethylenediaminetetraacetic acid was used alone, the fabricated particles frequently showed broken structures such as delamination at Ag shell/core Cu interface and hollow structure that are induced by excessive galvanic displacement reaction. As a result, fraction of defect particles increased up to 19.88% after the Ag plating of 40 wt.%. However, the fraction in the 40 wt.% Ag-coated Cu particles decreased to 9.01% and relatively smooth surface and dense microstructure in the Ag shell were also observed with additional usage of hydroquinone as a complexing agent. Ag-coated Cu particles having the enhanced microstructure did not show any weight increase by oxidation for exposure to air at $160^{\circ}C$ for 2 h, indicating increased oxidation resistance property.

내산화성 및 Ag 함량을 증가시킨 Cu계 필러 소재를 제조하고자 평균 직경 $2{\mu}m$의 구형 Cu 입자에 약 40 wt.% 수준으로 Ag를 코팅한 Ag 코팅 Cu 입자를 제조하여 그 내산화 거동을 분석하였다. Ethylenediaminetetraacetic acid 착화제만을 첨가하여 제조된 Ag 코팅 Cu 입자는 Ag 이온들과 Cu 원자들간의 과도한 갈바닉 치환 반응에 의한 Ag shell/Cu core 계면의 분리 및 입자 내부가 비어있는 결함 입자들이 종종 생성되어 Ag 코팅 Cu 입자의 형상이 무너지는 문제점들이 관찰되었다. 그 결과 40 wt.%의 Ag 코팅 후 결함 입자들의 총 분율은 19.88%까지 증가하였다. 그러나 hydroquinone 환원제를 추가적으로 첨가하여 40 wt.% Ag를 코팅시킨 Cu 입자들의 경우 결함 생성률이 9.01%까지 감소하였고, 표면이 매끄럽고 상대적으로 치밀한 Ag shell이 형성되면서 $160^{\circ}C$의 대기 중에서 2시간동안 노출 시에도 산화에 의한 무게 증가가 관찰되지 않아 향상된 내산화 특성을 나타내었다.

Keywords

References

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