Current Photovoltaic Research

  • 제5권4호
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  • Pages.105-108
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  • 2017
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  • 2288-3274(pISSN)
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  • 2508-125X(eISSN)
한국태양광발전학회 (Korea Photovoltaic Society)
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Reactive Ion Etching Process Integration on Monocrystalline Silicon Solar Cell for Industrial Production

  • 투고 : 2017.10.11
  • 심사 : 2017.12.07
  • 발행 : 2017.12.31
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초록

The reactive ion etching (RIE) technology which enables nano-texturatization of surface is applied on monocrystalline silicon solar cell. The additional RIE process on alkalized textured surface further improves the blue response and short circuit current. Such parameter is characterized by surface reflectance and quantum efficiency measurement. By varying the RIE process time and matching the subsequent processes, the absolute efficiency gain of 0.13% is achieved. However, the result indicates potential efficiency gain could be higher due to process integration. The critical etch process time is discussed which minimizes both front surface reflectance and etching damage, considering the challenges of required system throughput in industry.

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참고문헌

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