Observation of Discharge Mode Transient from Townsend to Glow at Breakdown of Helium Atmospheric Pressure Dielectric Barrier Discharge

헬륨 대기압 유전체 격벽 방전기의 타운젠트-글로우 방전 모드 전이 연구

  • Bae, Byeongjun (Department of Energy Systems Engineering, Seoul National University) ;
  • Kim, Nam-Kyun (Department of Energy Systems Engineering, Seoul National University) ;
  • Yoon, Sung-Young (Plasma Technology Research Center, National Fusion Research Institute) ;
  • Shin, Jun-Seop (Department of Energy Systems Engineering, Seoul National University) ;
  • Kim, Gon-Ho (Department of Energy Systems Engineering, Seoul National University)
  • 배병준 (서울대학교 공과대학 에너지시스템공학부) ;
  • 김남균 (서울대학교 공과대학 에너지시스템공학부) ;
  • 윤성영 (국가핵융합연구소 플라즈마기술연구센터) ;
  • 신준섭 (서울대학교 공과대학 에너지시스템공학부) ;
  • 김곤호 (서울대학교 공과대학 에너지시스템공학부)
  • Received : 2016.05.23
  • Accepted : 2016.06.10
  • Published : 2016.06.30

Abstract

The Townsend to glow discharge mode transition was investigated in the dielectric barrier discharge (DBD) helium plasma source which was powered by 20 kHz / $4.5 kV_{rms}$ high voltage at atmospheric pressure. The spatial profile of the electric field strength at each modes was measured by using the intensity ratio method of two helium emission lines (667.8 nm ($3^1D{\rightarrow}2^1P$) and 728.1 nm ($3^1S{\rightarrow}2^1P$)) and the Stark effect. ICCD images were analyzed with consideration for the electric field property. The Townsend discharge (TD) mode at the initial stage of breakdown has the light emission region located in the vicinity of the anode. The electric field of the light emitting region is close to the applied field in the system. Immediately, the light emitting region moves to the cathode and the discharge transits to the glow discharge (GD) mode. This mode transition can be understood with the ionization wave propagation. The electric field of the emitting region of GD near cathode is higher than that of TD near anode because of the cathode fall formation. This observation may apply to designing a DBD process system and to analysis of the process treatment results.

Keywords

References

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