Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Effect of Deposition Temperature on the Properties of Eu3+-doped MgMoO4 Phosphor Thin Films

증착 온도가 Eu3+ 이온이 도핑된 MgMoO4 형광체 박막의 특성에 미치는 영향

  • Kang, Dongkyun (Department of Materials Science and Engineering, Center for Green Fusion Technology) ;
  • Cho, Shinho (Department of Materials Science and Engineering, Center for Green Fusion Technology)
  • 강동균 (신라대학교 신소재공학과, 녹색융합기술센터) ;
  • 조신호 (신라대학교 신소재공학과, 녹색융합기술센터)
  • Received : 2016.01.26
  • Accepted : 2016.02.24
  • Published : 2016.02.29
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Abstract

$Eu^{3+}$-doped $MgMoO_4$ phosphor thin films were deposited on quartz substrates by radio frequency magnetron sputtering with changing various growth temperatures. The effects of growth temperature on the structure, transmittance, optical band gap, and luminescence of the phosphor thin films were characterized. All the phosphor thin films, irrespective of growth temperature, showed a monoclinic structure with a main (220) diffraction peak. The thin film deposited at a growth temperature of $400^{\circ}C$ indicated an average transmittance of 90% in the wavelength range of 500 ~ 1100 nm and band gap energy of 4.81 eV. The excitation spectra of the phosphor thin films consisted of a broad charge transfer band peaked at 284 nm in the range of 230 ~ 330 nm and two weak peaks located at 368 and 461 nm, respectively. The emission spectra under ultraviolet excitation at 284 nm exhibited a sharp emission peak at 614 nm and several weak bands. All the phosphor thin films showed high asymmetry ratio values, indicating that $Eu^{3+}$ ions incorporated into the host lattice occupied at the non-inversion symmetry sites. The results suggest that the growth temperature plays an important role in growing high-quality phosphor thin films.

Keywords

References

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