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Measurement of Particles Generated from PECVD Process using ISPM

ISPM을 이용한 PECVD 공정 내 발생입자 측정 연구

  • Kim, Dongbin (Sungkyunkwan University of Mechanical Engineering) ;
  • Mun, Jihun (Vacuum Technology Center, Korea Research Institute of Standards and Science) ;
  • Kim, HyeongU (Sungkyunkwan Advanced Institute of Nano Technology, Sungkyunkwan University) ;
  • Kang, Byung Soo (Vacuum Technology Center, Korea Research Institute of Standards and Science) ;
  • Yun, JuYoung (Vacuum Technology Center, Korea Research Institute of Standards and Science) ;
  • Kang, SangWoo (Vacuum Technology Center, Korea Research Institute of Standards and Science) ;
  • Kim, Taesung (Sungkyunkwan University of Mechanical Engineering)
  • 김동빈 (성균관대학교, 기계공학부) ;
  • 문지훈 (한국표준과학연구원, 진공기술센터) ;
  • 김형우 (성균관대학교, 나노과학기술협동학부) ;
  • 강병수 (한국표준과학연구원, 진공기술센터) ;
  • 윤주영 (한국표준과학연구원, 진공기술센터) ;
  • 강상우 (한국표준과학연구원, 진공기술센터) ;
  • 김태성 (성균관대학교, 기계공학부)
  • Received : 2015.06.18
  • Accepted : 2015.12.27
  • Published : 2015.12.31

Abstract

Particles which generated from plasma enhanced chemical vapor deposition (PECVD) during thin film deposition process can affect to the process yield. By using light extinction method, ISPM can measure particles in the large-diameter pipe (${\leq}300mm$). In our research, in-situ particle monitor (ISPM) sensor was installed at the 300 mm diameter exhaust-line to count the particles in each size. In-house flange for mounting the transmitting and receiving parts of ISPM was carefully designed and installed at a certain point of exhaust line where no plasma light affect to the light extinction measurement. Measurement results of trend changes on particle count in each size can confirm that ISPM is suitable for real-time monitoring of vacuum process.

Keywords