한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제28권3호
  • /
  • Pages.149-153
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  • 2015
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  • 1226-7945(pISSN)
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  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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AC-PDP의 방전지연 시간과 오방전 특성의 관계

The Relationship Between the Lag Time of the Discharge and the Characteristics of Mis-Discharge in an AC-PDP

  • 신재화 (인천대학교 전기공학과) ;
  • 김근수 (영산대학교 전기전자학과)
  • Shin, Jae-Hwa (Department of Electrical Engineering, Incheon National University) ;
  • Kim, Gun-Su (Department of Electrical and Electronics Engineering, Youngsan University)
  • 투고 : 2014.09.01
  • 심사 : 2015.02.09
  • 발행 : 2015.03.01
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초록

As the temperature of the panel increases in AC-PDPs, the minimum driving voltage increases. Also, as the more the number of discharge increases in cells, the probability of the strong dark discharge in the reset period increases. In this study, we investigated the relationship between the lag time of the discharge and the mechanism of mis-discharges which are the black noise and bright noise. We conclude that the variation of time lag characterizes the properties of exo-electron emission from MgO. Thus, we found that the main factor of the mis-discharges is the rate of change of the electron emission ability from the MgO surface.

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참고문헌

  1. J. H. Shin, M. G. Choi, and G. S. Kim, The Transactions of the Korean Institute of Electrical Engineers, 62, 83 (2013). https://doi.org/10.5370/KIEE.2012.62.1.083
  2. J. H. Shin and G. S. Kim, The Transactions of the Korean Institute of Electrical Engineers, 60, 577 (2011). https://doi.org/10.5370/KIEE.2011.60.3.577
  3. G. S. Kim and S. H. Lee, IEEE Transactions of Plasma Science, 38, 3136 (2010). https://doi.org/10.1109/TPS.2010.2076367
  4. G. S. Kim and S. H. Lee, IEEE Transactions of Plasma Science, 39, 1470 (2011). https://doi.org/10.1109/TPS.2011.2138170
  5. L. Oster and J. Haddad, Materials Science, 9, 297 (2003).
  6. Y. Motoyama, Y. Hirano, K. Ishii, Y. Murakami, and F. Sato, J. Appl. Phys., 95, 8419 (2004). https://doi.org/10.1063/1.1751239
  7. J. Dresner, J. Appl. Phys., 48, 4760 (1977). https://doi.org/10.1063/1.323487
  8. V. P. Nagorny, V. N. Khudik, and A. Shvydky, IEEE Transactions of Plasma Science, 34, 343 (2006). https://doi.org/10.1109/TPS.2006.872433