한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제47권5호
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  • Pages.252-256
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  • 2014
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  • 1225-8024(pISSN)
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  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
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High-temperature Oxidation of the TiAlCrSiN Film Deposited on the Cemented Hard Carbide

  • Lee, Dong Bok (School of Advanced Materials Science & Engineering, Sungkyunkwan University)
  • 투고 : 2014.10.08
  • 심사 : 2014.10.23
  • 발행 : 2014.10.31
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초록

The TiAlCrSiN film was deposited on the WC-20%TiC-10%Co carbide, and its oxidation behavior was examined at $700-1000^{\circ}C$. It displayed relatively good oxidation resistance owing to the formation of $TiO_2$, $Al_2O_3$, $Cr_2O_3$, and $SiO_2$ up to $900^{\circ}C$. However, at $1000^{\circ}C$, the fast oxidation rate and partial oxidation of WC in the substrate led to the formation of the thick, fragile oxide scale.

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참고문헌

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