마이크로전자및패키징학회지 (Journal of the Microelectronics and Packaging Society)

  • 제21권2호
  • /
  • Pages.31-35
  • /
  • 2014
  • /
  • 1226-9360(pISSN)
  • /
  • 2287-7525(eISSN)
한국마이크로전자및패키징학회 (The Korean Microelectronics and Packaging Society)
권호 표지
DOI QR코드

DOI QR Code

Thickness-dependent Electrical, Structural, and Optical Properties of ALD-grown ZnO Films

  • Choi, Yong-June (Department of Materials Science and Engineering, Yonsei University) ;
  • Kang, Kyung-Mun (Department of Materials Science and Engineering, Yonsei University) ;
  • Park, Hyung-Ho (Department of Materials Science and Engineering, Yonsei University)
  • 투고 : 2014.05.16
  • 심사 : 2014.06.13
  • 발행 : 2014.06.30
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

The thickness dependent electrical, structural, and optical properties of ZnO films grown by atomic layer deposition (ALD) at various growth temperatures were investigated. In order to deposit ZnO films, diethylzinc and deionized water were used as metal precursor and reactant, respectively. ALD process window was found at the growth temperature range from $150^{\circ}C$ to $250^{\circ}C$ with a growth rate of about $1.7{\AA}/cycle$. The electrical properties were studied by using van der Pauw method with Hall effect measurement. The structural and optical properties of ZnO films were analyzed by using X-ray diffraction, field emission scanning electron microscopy, and UV-visible spectrometry as a function of thickness values of ZnO films, which were selected by the lowest electrical resistivity. Finally, the figure of merit of ZnO films could be estimated as a function of the film thickness. As a result, this investigation of thickness dependent electrical, structural, and optical properties of ZnO films can provide proper information when applying to optoelectronic devices, such as organic light-emitting diodes and solar cells.

키워드

참고문헌

  1. J. H. Yoo and H. J. Chang, "Preparation of polymer light emitting diodes with PFO-poss organic emission layer on ITO/glass substrates", J. Microelectron. Packag. Soc., 13(4), 51 (2006).
  2. Y.-J. Choi, K.-M. Kang and H.-H. Park, "Compositional Study of Surface, Film, and Interface of Photoresist-Free Patternable $SnO_2$ Thin Film on Si Substrate Prepared by Photochemical Metal-Organic Deposition", J. Microelectron. Packag. Soc., 21(1), 1 (2014).
  3. J. Y. Kim, Y.-J. Choi and H.-H. Park, "Surface Oxidation Effect During high Temperature Vacuum Annealing on the Electrical Conductivity of ZnO thin Films Deposited by ALD", J. Microelectron. Packag. Soc., 19(2), 73 (2012). https://doi.org/10.6117/kmeps.2012.19.2.073
  4. Logothetidis, S., "Flexible organic electronic devices: Materials, process and applications", Mater. Sci. Eng. B, 152(1-3), 96 (2008). https://doi.org/10.1016/j.mseb.2008.06.009
  5. E. Fortynato, D. Ginley, H. Hosono and D. C. David, "Transparent Conducting Oxides for Photovoltaics", MRS Bull., 32(03), 242 (2007). https://doi.org/10.1557/mrs2007.29
  6. J.-H. Lee, K.-H. Ko and B.-O. Park, "Electrical and optical properties of ZnO transparent conducting films by the sol-gel method", Thin Solid Films, 247(1-2), 119 (2003).
  7. Y.-J. Choi, H.-H. Park, H. Kim, H.-H. Park, H.J. Chang and H. Jeon, "Fabrication and characterization of direct-patternable ZnO films containing Pt nanoparticles", Jpn. J. Appl. Phys., 48, 035504 (2009). https://doi.org/10.1143/JJAP.48.035504
  8. P. F. Carcia, R. S. McLean, M. H. Reilly and G. Nunes Jr., "Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering", Appl. Phys. Lett., 82(7)., 1117 (2003). https://doi.org/10.1063/1.1553997
  9. H. Z. Wu, K. M. He, D. J. Qiu and D. M. Huang, "Low-temperature epitaxy of ZnO films on (001) and silica by reactive e-beam evaporation", J. Cryst. Growth., 217(1-2), 131 (2000). https://doi.org/10.1016/S0022-0248(00)00397-3
  10. X. W. Sun and H. S. Kwok, "Optical properties of epitaxially grown zinc oxide films on sapphire by pulsed laser deposition", J. Appl. Phys., 86, 408 (1999). https://doi.org/10.1063/1.370744
  11. M. Purica, E. Budianu, E. Rusu, M. Danila and R. Gavrila, "Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD)", Thin Solid Films, 403-404, 485 (2002). https://doi.org/10.1016/S0040-6090(01)01544-9
  12. Y.-J. Choi, S.C. Gong, C.-S. Park, H.-S. Lee, J.G. Jang, H.J. Chang, G.Y. Yeom and H.-H. Park, "Improved performance of organic light-emitting diodes fabricated on Al-doped ZnO anodes incorporating a homogeneous Al-doped ZnO buffer layer grown by atomic layer deposition", ACS Appl. Mater. Interfaces, 5, 3650 (2013). https://doi.org/10.1021/am400140c
  13. Y.-J. Choi and H.-H. Park, "A simple approach to the fabrication of fluorine-doped zinc oxide thin films by atomic layer deposition at low temperatures and an investigation into the growth mode", J. Mater. Chem. C, 2, 98 (2014). https://doi.org/10.1039/c3tc31478b
  14. G. Haacke, "New figure of merit for transparent conductors", J. Appl. Phys., 47, 4086 (1976). https://doi.org/10.1063/1.323240