한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제47권1호
  • /
  • Pages.53-56
  • /
  • 2014
  • /
  • 1225-8024(pISSN)
  • /
  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지
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지뢰탐지를 위한 ECR 플라즈마에서 타깃에 고전압 DC 펄스 인가시 전압-전류 특성 분석

I-V Characteristics of Negatively DC Pulsed Target in ECR Plasma for Landmine Detection

  • 김성봉 (국가핵융합연구소 플라즈마기술연구센터) ;
  • 이희재 (포항공과대학교 물리학과) ;
  • 박승일 (국가핵융합연구소 플라즈마기술연구센터) ;
  • 유석재 (국가핵융합연구소 플라즈마기술연구센터) ;
  • 조무현 (포항공과대학교 물리학과) ;
  • 한승훈 (삼성탈레스 ISR/PGM 연구소) ;
  • 임병옥 (삼성탈레스 ISR/PGM 연구소)
  • 투고 : 2014.02.17
  • 심사 : 2014.02.24
  • 발행 : 2014.02.28
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초록

I-V characteristics of a cylindrical target in an ECR plasma were studied for sheath spatial evolutions when the target was pulsed biased to a high negative potential. The magnetic field effects on sheath thickness and sheath boundary speed were investigated by comparison between the experimental results and the theoretical results using the Child-Langmuir sheath model. The results showed that the magnetic field suppressed electron motion away from the target so that sheath thickness and sheath boundary speed decreased.

키워드

참고문헌

  1. K. N. Leung et al., Rev. Sci. Instrum., 62 (1991) 100. https://doi.org/10.1063/1.1142315
  2. J. Reijonen, K. N. Leung, G. Jones, Rev. Sci. Instrum., 73 (2002) 934. https://doi.org/10.1063/1.1430519
  3. S. Hahto et al., Rev. Sci. Instrum., 76 (2005) 023304. https://doi.org/10.1063/1.1852871
  4. M. A. Lieberman, A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (2005).

피인용 문헌

  1. Bipolar Pulse Bias Effects on the Properties of MgO Reactively Deposited by Inductively Coupled Plasma-Assisted Magnetron Sputtering vol.23, pp.3, 2014, https://doi.org/10.5757/ASCT.2014.23.3.145