반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

대향 타겟식 스퍼티링법을 이용한 저저항 투명전도 다층박막의 제작

Preparation of Low Resistivity Transparent Conductive multilayer Thin Films by The Facing Targets Sputtering

  • 김상모 (가천대학교 전기공학과) ;
  • 박용서 (가천대학교 전기공학과)
  • Kim, Sang Mo (Department of Electrical Engineering, Gachon University) ;
  • Park, Yong Seo (Department of Electrical Engineering, Gachon University)
  • 투고 : 2014.05.08
  • 심사 : 2014.05.30
  • 발행 : 2014.06.30
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초록

We prepared the ITO/Ag multilayer thin films on soda-lime glass substrate by the Facing Target Sputtering System (FTS) at room temperature. To confirm the effect of Ag layer in ITO/Ag multilayer thin films, we have prepared various range of Ag layer in its thickness and investigated prior to the setting of ITO/Ag multilayer thin films. The thickness of Ag layer was controlled by the sputtering deposition time. Properties of as-prepared samples were investigated by using a four-point probe, UV-Visual spectrometer with a spectral visual range (400 - 800 nm) and X-ray diffractometer (XRD). As a result, the transmittance of as-prepared samples turned out to be very low in the visible range due to light-scattering on the surface of thin film as the thickness of Ag layer got increased. However, reduction of phenomenon of light-reflection in visual range was observed around 20nm of Ag thickness. We prepared the ITO/Ag multilayer thin film with a resistivity of about $8{\times}10^{-5}[{\Omega}-cm]$ and a transmittance of more than 80 % at 550 nm.

키워드

참고문헌

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