DOI QR코드

DOI QR Code

NiO Films Formed at Room Temperature for Microbolometer

  • Jung, Young-Chul (Department of Electrical Energy and Computer Engineering, Gyeongju University) ;
  • Koo, Gyohun (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
  • Lee, Jae-Sung (Division of Green Energy Engineering, Uiduk University) ;
  • Hahm, Sung-Ho (School of Electrical Engineering and Computer Science, Kyungpook National University) ;
  • Lee, Yong Soo (School of Electrical Engineering and Computer Science, Kyungpook National University)
  • 투고 : 2013.08.01
  • 심사 : 2013.09.25
  • 발행 : 2013.09.30

초록

Nickel oxide films using RF sputter was formed on the $SiO_2/Si$ substrate at the room temperature controlled with water circulation system. The feasibility of nickel oxide film as a bolometric material was demonstrated. GIXRD spectrum on NiO(111), NiO(200), and NiO(220) orientation expected as the main peaks were appeared in the grown nickel oxide films. The typical resistivity acquired at the RF power of 100W was about $34.25{\Omega}{\cdot}cm$. And it was reduced to $18.65{\Omega}{\cdot}cm$ according to the increase of the RF power to 400W. The TCR of fabricated micro-bolometer with the resistivity of $34.25{\Omega}{\cdot}cm$ was $-2.01%/^{\circ}C$. The characteristics of fabricated nickel oxide film and micro-bolometer were analyzed with XRD pattern, resistivity, TCR, and SEM images.

키워드

참고문헌

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피인용 문헌

  1. Studies on Magnetron-Sputtered NiO/Si3N4 Thin Films 2017, https://doi.org/10.1142/S0219581X17600390