References
- Bello D, Woskie SR, Streicher RP, Liu Y, Stowe MH, Eisen EA, Ellenbeckner MJ, Sparer J, Youngs F, Cullen MR, Redlich CA. Polyisocyanates in occupational environments: a critical review of exposure limits and metrics. Am J Ind Med 2004;46:480-491 https://doi.org/10.1002/ajim.20076
- Bello D, Spacer CA, Redlich K, Lbrahim MH, Stowe, Y Liu. Slow curing of aliphatic polyisocyanate paints in automotive refinishing: A potential source for skin exposure. J Occup environ Hyg 2007a;4:406-411 https://doi.org/10.1080/15459620701341199
- Bello D, Herrick CA, Smith TJ, Woskie SR, Streicher RP, Cullen MR, Liu Y, Redlich CA. Skin exposure to isocyanates: reason for concern. Eviron Health Perspect 2007b;115(3):328-335
- Bernstein DI, Chang-Yeung M.. Asthma in the workplace. 3rd ed. New York: Taylor & Francis Group; 2006.
- Boutin M, Dufresne A, Ostiguy C, Lesage J. Determination of airborne isocyanate generated during the thermal degradation of car paint in body repair shops. Ann. Occup Hyg 2006;50(4):385-393 https://doi.org/10.1093/annhyg/mei075
- Dietemann-Molard A, Kopferschmitt-Kubler MC, Meyer PD, Tomb R, Pauli G. Allergic asthma due to domestic use of insulating polyurethane foam. Lancet 1991;338-353
- Donnelly R, Buik JB, MAcmahon J. Occupational asthma after exposure to plaster casts containing methylene diphenyl diisocyanate. Occup Med(lond) 2004;54(6):432-434 https://doi.org/10.1093/occmed/kqg133
- Farfel MR, Lees PS, Rohde CA, Lim BS, Bannon D. Comparison of wipe and cyclone methods for the determination of lead in residential dusts. App Occup Environ Hyg 1994;9(12):1006-1012 https://doi.org/10.1080/1047322X.1994.10388447
- Fent K, Jayaraj K, Gold A, Ball L, Nylander-French L. Tape-strip sampling for measuring dermal exposure to 1,6-hexamethylene diisocyanate. Scan J Work Environ Helath 2006;32(3):225-231 https://doi.org/10.5271/sjweh.1003
- Gagne S, Lesage J, Ostiguy C, Tra HV. Determination of unreacted 2,4-toluene diisicyanate(2,4TDI) and 2,6-toluene diisocyanate(2,6TDI) in foams at ultratrace level by using HPLC-CIS-MS-MS. Analyst 2003;128:1447-1451 https://doi.org/10.1039/b310463j
- Gold RE, Leavitt JRC, Holeslaw T, Tupy D. Exposure of urban applicators to carbaryl. Arch Environ Contam Toxicol 1982;11:63-67 https://doi.org/10.1007/BF01055187
- Karal MH, Hauth BA, Riley EJ, Magreni CM. Dermal contact with toluene diisocyanate(TDI) produces respiratory tract sensitivity in guinea pigs. Toxico Appl Pharmacol 1981;58:221-230 https://doi.org/10.1016/0041-008X(81)90426-9
- Leavitt JRC, Gold RE, Holeshaw T, Tupy D. Exposure of professional pesticide applicators to carbaryl. Arch Environ Contam Toxicol 1982;11:57-62 https://doi.org/10.1007/BF01055186
- Legris M, Lesage J, Trucot A, Bellemare D, Prudhomme H. Exposure to isocyanate during the making of Orthopedic plaster casts(in french). Quebec: CLSC Chutes- de-la-chaudiere-desjardins; 1995.
- Littorin M, Welinder H, Skarping G, Dalene M, Skerfving S. Exposure and nasal inflammation in workers heating polyurethane. Int Arch Occup Environ Health 2002;75(7):468-474 https://doi.org/10.1007/s00420-002-0337-1
- Methner MM, Fenske RA. Dermal measurement and wipe sampling methods: a review. Appl Occup Environ Hyg 1992;7(9):599-606 https://doi.org/10.1080/1047322X.1992.10388051
- Occupational Safety and health administration(OSHA). Sampling for surface contamination I: OSHA technical manual. Salt lake city, Utah; OSHA; 1999.
- Rattray NJ, Botham PA, Hext PM, Woodcock DR, Fielding I, Dearman RJ, Kimber I. Induction of respiratory hypersensitivity to diphenylmethane-4,4'-diisocyanate (MDI) in guineapigs. Influence of route of exposure. Toxicol 1994;88:15-30 https://doi.org/10.1016/0300-483X(94)90108-2
- Sommer BG, Sherson DL, Kjoller H, Hansen I, Clausen G, Jepsen JR. Asthma caused by methylene diphenyl diisocyanate cast in a nurse(in Danish). Ugeskr Laeger 2000;162(4):505-506
- Tartre A. Investigation of surface contamonation in cadmium pigment factory. Appl Occup Environ Hyg 1992;7(5):318-322 https://doi.org/10.1080/1047322X.1992.10390162
- Zeller E, Suleswski R. Glove permeation by propylene glycol monomethyl ether acetate- a photoresist solvent used in semiconductor device processing. Appl Occup Environ Hyg 1992;7(6):392-397 https://doi.org/10.1080/1047322X.1992.10390177