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Reduction of Light Reflectance from InAlP by the Texture Formation Using Ultra-Thin Pt Layer

Pt 금속 박막을 이용한 InAlP층의 텍스쳐 구조 형성 및 반사율 측정

  • Shin, Hyun Wook (Department of Applied Physics, Kyung Hee University) ;
  • Shin, Jae Cheol (Photonic-Energy Center, Korea Photonics Technology Institute) ;
  • Kim, Hyo Jin (Photonic-Energy Center, Korea Photonics Technology Institute) ;
  • Kim, Sung (Department of Applied Physics, Kyung Hee University) ;
  • Choe, Jeong-Woo (Department of Applied Physics, Kyung Hee University)
  • 신현욱 (경희대학교 응용물리학과) ;
  • 신재철 (한국광기술원 광에너지연구센터) ;
  • 김효진 (한국광기술원 광에너지연구센터) ;
  • 김성 (경희대학교 응용물리학과) ;
  • 최정우 (경희대학교 응용물리학과)
  • Received : 2013.02.18
  • Accepted : 2013.04.26
  • Published : 2013.05.30

Abstract

Textured surface has been fabricated to reduce the light reflectance from the solar cells. The textured surface is very suitable for the multi-junction III-V solar cells because it can decrease the light reflectance over a large wavelength range. In this study, we have generated a textured structure on InAlP which is used for the window layer of the multi-junction III-V solar cells. Ultra-thin Pt layer (0.7 nm) has been used for wet etching mask. An array of nanosized pyramid shape formed on InAlP surface dramatically reduces the light reflectance up to 13.7% over a large wavelength range (i.e., $0.3{\sim}1.5{\mu}m$).

태양전지의 표면에 텍스쳐 구조를 형성하면 빛의 반사율을 줄일 수 있으므로 태양전지의 효율을 증가시킬 수 있다. 또한 표면의 텍스쳐 구조는 넓은 파장대역에서 빛의 반사를 줄여주기 때문에 다중접합 III-V화합물 태양전지에 아주 유용하다. 본 연구에서는 얇은 Pt층을 식각 마스크로 사용하여 다중접합 III-V태양전지의 window층으로 사용되는 InAlP층에 다양한 텍스쳐 구조를 형성하고 반사율을 측정하였다. 습식식각에 의해 나노미터 크기로 형성된 피라미드 꼴 텍스쳐 구조는 $0.3{\sim}1.5{\mu}m$의 넓은 파장영역에서 빛의 반사율을 13.7%까지 감소시켰다.

Keywords

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