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Influence of Heat-Treatment on the Adhesive Strength between a Micro-Sized Bonded Component and a Silicon Substrate under Bend and Shear Loading Conditions

  • Ishiyama, Chiemi (Precision and Intelligence Laboratory, Tokyo Institute of Technology)
  • 투고 : 2012.02.28
  • 심사 : 2012.04.13
  • 발행 : 2012.04.30

초록

Adhesive bend and shear tests of micro-sized bonded component have been performed to clarify the relationship between effects of heat-treatment on the adhesive strength and the bonded specimen shape using Weibull analysis. Multiple micro-sized SU-8 columns with four different diameters were fabricated on a Si substrate under the same fabrication condition. Heat-treatment can improve both of the adhesive bend and shear strength. The improvement rate of the adhesive shear strength is much larger than that of the adhesive bend strength, because the residual stress, which must change by heat-treatment, should effect more strongly on the shear loading. In case of bend type test, the adhesive bend strength in the smaller diameters (50 and $75\;{\mu}m$) widely vary, because the critical size of the natural defect (micro-crack) should vary more widely in the smaller diameters. In contrast, in case of shear type test, the adhesive shear strengths in each diameter of the columns little vary. This suggests that the size of the natural defects may not strongly influence on the adhesive shear strength. All the result suggests that both of the adhesive bend and shear strengths should be complicatedly affected by heat-treatment and the bonded columnar diameter.

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참고문헌

  1. International Technology Roadmap for Semiconductors(ITRS) 2011 Ed. (Executive Summary), pp. 1-12 (2011)
  2. R. T. Howe, "Surface micromachining for microsensors and microactuators," J. Vac. Sci. Technol. B, Vol. 6, pp. 1809-1813 (1988) https://doi.org/10.1116/1.584158
  3. K. A. Shaw, Z. L. Zhang and N. C. MacDonald, "SCREAM 1: a single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures," Senc. Actuators A, Vol. 40, pp. 63-70 (1994) https://doi.org/10.1016/0924-4247(94)85031-3
  4. E. Bassous, "Fabrication of novel three-dimensional microstructures by anisotropic etching of (100) and (110) silicon," IEEE Trans. Electron Devices, Vol. ED-25, pp. 1178-1185 (1978)
  5. W. Bacher, W. Menz and l. Mohr, "The LIGA technique and its potential for microsystems-a survey," IEEE Trans. Electron, Vol. 42, pp. 431-441 (1995) https://doi.org/10.1109/41.464604
  6. E. W. Becker, W. Ehrfeld, P. Hagmann, A. Maner and D. Miinchmeyer, "Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)," Microelectron. Eng., Vol. 4, pp. 35-56 (1986) https://doi.org/10.1016/0167-9317(86)90004-3
  7. C. Chang, Y. F. Wang, Y. Kanamori, J. J.  Shih, Y. Kawai, C. K. Lee, K. C. Wu and M. Esashi, "Etching submicrometer trenches by using the Bosch process and its application to the fabrication of antireflection structures," J. Micromech. Microeng., Vol. 15 pp. 580-585 (2005) https://doi.org/10.1088/0960-1317/15/3/020
  8. C. Ishiyama, J. Hata, S. Koyama, M. Sone and Y. Higo, "Development of evaluation method for delamination strength between micro-sized materials in MEMS devices," Mater. Res. Soc Symp. Proc., Boston, Massachusetts, USA, Vol. 977, pp. 228-233 (2006)
  9. C. Ishiyama, A. Shibata, M. Sone and Y. Higo, "Effect of Aspect ratio of micro-sized photoresist patterns on bond strength between a Si substrate with AFM fracture observation," Mater. Res. Soc Symp. Proc., Boston, Massachusetts, USA, Vol. 1139, pp. 71-76 (2009)
  10. C. Ishiyama, M. Sone and Y. Higo, "Development of new evaluation method for adhesive strength between microsized photoresist and Si substrate of MEMS devices," Key Engineering Materials, Vol. 345-346, pp. 1185-1188 (2007) https://doi.org/10.4028/www.scientific.net/KEM.345-346.1185
  11. C. Ishiyama, M. Sone and Y. Higo, "Effects of heat curing on adhesive strength between microsized SU-8 and Si substrate," Proc. of SPIE, Vol. 6533, pp. 65331F1-F8
  12. H. Lorenz, M. Despont, P. Vettiger and P. Renaud, "Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist," Microsyst. Technol., Vol. 4, pp. 143-146 (1998) https://doi.org/10.1007/s005420050118
  13. S. Bystrova, R. Luttge, and A. van den Berg, "Study of crack formation in high-aspect ratio SU-8 structures on silicon," Microelectro. Eng. Vol. 84, pp. 1113-1116 (2007) https://doi.org/10.1016/j.mee.2007.01.091